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Aspheric parameter error interference measurement method and system combined with total reflection angle positioning

A technology of interferometric measurement and total reflection angle, which is applied in the direction of measuring devices, instruments, and optical devices, etc., can solve the problems of very high accuracy requirements for the assembly and adjustment of two-way pinholes and microscopic objective lenses, and a huge system, and achieve simple structure, High precision, the effect of improving measurement accuracy

Active Publication Date: 2020-01-14
BEIJING INSTITUTE OF TECHNOLOGYGY
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Problems solved by technology

[0006] However, the laser differential confocal positioning system (not included in this patent) adopted by this method generally includes: a confocal lens, a beam splitter and two sets of pinholes with identical parameters, a microscope objective lens and a detector. The precision of the assembly and adjustment of the pinhole and the microscope objective lens is very high, and the system is relatively large

Method used

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  • Aspheric parameter error interference measurement method and system combined with total reflection angle positioning
  • Aspheric parameter error interference measurement method and system combined with total reflection angle positioning
  • Aspheric parameter error interference measurement method and system combined with total reflection angle positioning

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Embodiment Construction

[0028] (1) if figure 1 As shown, this aspheric parameter error interferometry method combined with total reflection angle positioning obtains the nominal parameters of the measured aspheric surface, uses optical design software to design a part of the compensation lens P, obtains the design parameters of the designed part of the compensation lens P, and establishes The interferometric optical path of the aspheric surface parameter error interferometric measurement system, to obtain the nominal optimal compensation distance d 0 , d 0 is the distance from the second surface of the partially compensated mirror P to the apex of the ideal aspheric surface;

[0029] (2) According to the design parameters of the partially compensated lens P after design obtained in step (1), the real object of the partially compensated lens P is processed, and the interferometric measurement of the aspheric parameter error interferometry system is built together with the reference plane mirror and t...

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Abstract

The invention discloses an aspheric parameter error interference measurement method and system combined with total reflection angle positioning. An aspheric parameter error interference measurement system is established by combining a total reflection angle positioning system, so a complex laser differential confocal system does not need to be built, the influence of the adjustment error of the laser differential confocal system on the measurement precision is avoided, and the measurement precision of the surface type parameter error of the aspheric surface is further improved; moreover, the non-contact, full-aperture and high-precision measurement can be achieved, and the system has the advantages of simple structure and convenient adjustment.

Description

technical field [0001] The invention relates to the technical field of optical aspheric surface measurement, in particular to an aspheric surface parameter error interferometric method combined with total reflection angle positioning, and an aspheric surface parameter error interferometric system combined with total reflection angle positioning. Background technique [0002] The surface parameters of an aspheric surface include the vertex curvature radius and the quadric surface constant. These two parameters together determine the shape characteristics of the aspheric surface. Among them, the radius of curvature of the vertex not only affects the profile of the aspheric surface, but also determines the basic properties of the aspheric surface, which in turn affects the aberration and imaging quality of the optical system; and the quadric surface constant It is the classification basis of aspheric surface. Accurate measurement of surface parameter errors is very important f...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24G01B11/255G01B11/02
CPCG01B11/02G01B11/2441G01B11/255
Inventor 郝群胡摇陶鑫宁悦文
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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