Defect detection device and defect detection method

Abstract

The invention discloses a defect detection device and a defect detection method. The defect detection device comprises an illumination module and an imaging detection module; the illumination module is used for generating a detection light beam and enabling the detection light beam to be incident on a detection surface of a product to be detected; the imaging detection module is used for detectingwhether the detection light beam is scattered by the detection surface of the product to be detected to generate a scattered imaging light beam or not, and determining defect information of the product to be detected according to the scattered imaging light beam; the illuminance of the detection light beam satisfies that (U1*R) / (U2*L) is greater than or equal to S1; and the half width W of the detection light beam satisfies that d*[tan alpha+ tan beta] is greater than FOV / 2+W. According to the embodiments, the detection light beam generated by the illumination module is determined by determining the relative illuminance between the half-wide edge of the detection light beam and the center of the detection light beam and the half-width of the detection light beam, so that crosstalk generated in the defect detection process is suppressed, and the defect detection precision is improved.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of defect detection, and in particular, to a defect detection device and a defect detection method. Background technique [0002] In the manufacturing process of semiconductor integrated circuits or flat panel displays, in order to maintain a high yield rate of products, defects (including foreign particles, fingerprints, scratches, pinholes, etc.) etc.) to achieve the purpose of pollution control. [0003] figure 1 It is a schematic diagram of the structure of an existing defect detection device. Generally, the particle detection device integrated in the lithography equipment usually adopts the dark field scattering measurement technology, and its detection principle is as follows: figure 1 As shown, the illumination light 101 emitted from the light source 10 is scattered by the defect 114 on the object 104 to be tested, and the scattered light 102 is finally detected by the detector...

AI Technical Summary

Problems solved by technology

[0004] However, in the process of defect detection of existing defect detection devices, the pattern on the lower surface of the product to be tested is prone to generate crosstalk signals, which affects the accuracy of defect detection results

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