A Uniform Electromagnetic Field Device for Plasma Velocity Screening Instrument
A plasma and electromagnetic field technology, applied in the field of plasma measurement, can solve problems such as technical bottlenecks in the design of uniform electromagnetic field structures, and achieve the effects of easy installation accuracy, machining performance, reasonable relative position accuracy, and uniform electric field intensity distribution
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[0029] In order to understand the above-mentioned purpose, features and advantages of the present invention more clearly, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be noted that, in the case of no conflict, the embodiments of the present application and the features in the embodiments can be combined with each other.
[0030] In the following description, many specific details are set forth in order to fully understand the present invention. However, the present invention can also be implemented in other ways different from those described here. Therefore, the protection scope of the present invention is not limited by the specific details disclosed below. EXAMPLE LIMITATIONS.
[0031] Such as figure 1 and figure 2 As shown, a uniform electromagnetic field device for a plasma velocity screening instrument is characterized in that it includes a first ceramic plate 1, a sec...
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