Chemical vapor deposition equipment, ceramic heating disc and preparation method of ceramic heating disc

Abstract

The invention provides chemical vapor deposition equipment, a ceramic heating disc and a preparation method of the ceramic heating disc. The ceramic heating disc comprises a heating disc body and a ceramic tube, wherein the heating disc body comprises a first aluminum nitride ceramic base plate, a heating sheet, and a second aluminum nitride ceramic base plate which are sequentially stacked from bottom to top; each layer is bonded by heat-conducting ceramic slurry, and the heating disc is subjected to sintering to form a whole; and the heat conductivity of an obtained first ceramic body is lower than that of a second ceramic body. The chemical vapor deposition equipment comprises the ceramic heating disc. The preparation method of the ceramic heating disc comprises the following steps thatthe first aluminum nitride ceramic base plate, the heating sheet, the second aluminum nitride ceramic base plate, an electrode plate and a third aluminum nitride ceramic base plate are bonded throughthe ceramic slurry in sequence, and the heating plate body is obtained through hot-pressing sintering. According to the chemical vapor deposition equipment, the ceramic heating disc and the preparation method, most of heat generated by the heating sheet is transferred upwards, so that the whole resistance arrangement of the heating disc is more simple and easy to operate, interference factors canbe reduced, and the temperature can be better controlled in the wafer etching or deposition process.

Description

technical field [0001] The invention belongs to the field of semiconductor applications, and relates to semiconductor manufacturing equipment, more specifically, to a chemical vapor deposition equipment, a ceramic heating plate and a preparation method of the ceramic heating plate. Background technique [0002] Chemical vapor deposition equipment (Chemical VaporDeposition equipment, referred to as CVD equipment) is the key equipment for semiconductor chip production. The core issue of CVD equipment is how to ensure the uniformity and repeatability of material growth. As a structure in CVD equipment, the chip heating plate The uniformity of temperature during heating and the corrosion resistance of the substrate of the heating plate will directly affect the uniformity and repeatability of chip growth. [0003] Existing ceramic heating plates are mainly divided into alumina ceramic heating plates and aluminum nitride ceramic heating plates. The alumina ceramic heating plate i...

AI Technical Summary

Problems solved by technology

However, the heat conduction efficiency of the existing aluminum nitride ceramic heating plate and the uniformity of heating the wafer on it still need to be improved.

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