Display device and preparation method thereof
A technology for display devices and substrates, which is used in the manufacture of semiconductor/solid-state devices, instruments, diodes, etc., and can solve the problems of low color temperature of white light, yellowish color point, and low blue-off intensity of display devices.
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Embodiment 1
[0033] refer to figure 1 , shows a display device 10, the device includes:
[0034] Substrate 10, a planarization layer 20 covering the substrate 10, and a protective layer 30 covering the side of the planarization layer 20 away from the substrate 10; the protective layer 30 has thermal conductivity, transparency and insulation sex.
[0035] In the embodiment of the present invention, the substrate 10 is a TFT glass substrate. The planarization layer 20 is a resin material.
[0036] In the embodiment of the present invention, the protective layer 30 includes: a silicon dioxide thin film layer. Wherein, the silicon dioxide thin film layer can be prepared by a sol-gel method.
[0037] In the embodiment of the present invention, the protection layer 30 has good thermal conductivity, transparency and insulation.
[0038] Wherein, the thickness of the protective layer 30 includes: 1 μm-3 μm.
[0039] Wherein, the display device further includes: an anode layer 40, a pixel def...
Embodiment 2
[0046] refer to figure 2 , showing a flowchart of steps of a method for manufacturing a display device provided by an embodiment of the present invention; the method specifically includes the following steps:
[0047] Step 201, providing a substrate.
[0048] In an embodiment of the present invention, the substrate includes: a TFT glass substrate.
[0049] Step 202, coating a planarization layer on the substrate.
[0050] In an embodiment of the present invention, the material of the planarization layer includes: a resin material.
[0051] Step 203 , preparing a protective layer on the side of the planarization layer away from the substrate.
[0052] In the embodiment of the present invention, refer to image 3 , step 203 includes:
[0053] Step 2031, prepare silica sol;
[0054] Step 2032, coating the silica sol on the side of the planarization layer away from the substrate;
[0055] Step 2033, heating and curing the silica sol to obtain a silica film layer.
[0056]...
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