Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Modeling method for czochralski silicon single crystal pulling speed-crystal diameter identification model

A technology of identification model and modeling method, applied in the field of Czochralski silicon single crystal pulling speed-crystal diameter identification model modeling, which can solve the problems of generalization ability restriction, complex crystal growth process mechanism, difficult to meet precise control and other problems

Active Publication Date: 2019-07-12
XIAN UNIV OF TECH
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The lumped parameter model method is only suitable for systems that can write mathematical expressions, and needs to select a large number of parameters, which requires high precision in parameter selection, and the mechanism of the crystal growth process is too complicated. Therefore, when describing the mathematical expressions of the system, a certain Some factors are ignored, resulting in the obtained model is not accurate enough, it is difficult to meet the requirements of precise control
The limitation of the shallow structure algorithm lies in the limited ability to express complex functions under limited samples and computing units, and the generalization ability for complex classification and regression problems is subject to certain constraints.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Modeling method for czochralski silicon single crystal pulling speed-crystal diameter identification model
  • Modeling method for czochralski silicon single crystal pulling speed-crystal diameter identification model
  • Modeling method for czochralski silicon single crystal pulling speed-crystal diameter identification model

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0141] First, in order to improve the calculation speed, every 5 data of the pulling speed and crystal diameter of the Czochralski silicon single crystal at different moments are sampled once, and the sampling time is 2s. The data of pulling speed and crystal diameter obtained by sampling are as follows: figure 2 , image 3 As shown in , the data of lifting speed and crystal diameter of each sampling are recorded into multiple sets of data pairs. Since the magnitudes of crystal lifting speed and diameter data are different, the data are normalized to the range of [0, 1], as The deep belief network is the input of the DBN network, of which 700 groups are selected as training data and 300 groups are used as test data.

[0142] After establishing the discrete-time nonlinear system about the pulling speed and crystal diameter of the Czochralski silicon single crystal, 700 sets of data pairs are input into the system, such as Figure 4 It is shown that when the input order is fix...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a modeling method for a czochralski silicon single crystal pulling speed-crystal diameter identification model. The method specifically comprises the following steps: step 1, sampling for multiple times, recording the pulling speeds and crystal diameters of a czochralski silicon single crystal at different sampling moments k, and forming a plurality of groups of data pairs at different sampling moments k; step 2, determining to obtain a specific discrete time nonlinear system model expression about the pulling speed and the crystal diameter of the czochralski silicon single crystal; step 3, training the DBN network; step 4, taking trained DBN network as a czochralski silicon single crystal pulling speed-crystal diameter identification model. According to the modelingmethod of the Czochralski silicon single crystal pulling speed-crystal diameter identification model, the defects existing in training by adopting a DBN network in the prior art are overcome.

Description

technical field [0001] The invention belongs to the technical field of silicon single crystal growth identification methods, in particular to a Czochralski silicon single crystal pulling speed-crystal diameter identification model modeling method. Background technique [0002] As one of the basic materials of the semiconductor industry, silicon single crystal plays an important role in the development of the integrated circuit industry. With the development of very large-scale integrated circuits, the requirements for large size and high quality of silicon single crystal have been put forward. At present, the most important method for preparing silicon single crystal is the Czochralski method based on the traditional control structure. In the traditional control structure, the crystal pulling speed depends on manual experience and the controller parameters are often obtained through repeated experiments. In addition, the relationship between crystal diameter and crystal pu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06N3/04G06N3/08C30B15/22C30B29/06
CPCG06N3/084C30B29/06C30B15/22G06N3/048G06N3/044G06N3/045
Inventor 刘丁张晶
Owner XIAN UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products