Preparation method and application of a low-temperature sputtering α-ta coating in a large aspect ratio inner cavity

A technology with large aspect ratio and inner cavity, applied in the field of material science, can solve the problems of reducing the mechanical properties of steel materials, expensive inert gas, difficult to popularize and apply, etc. The effect of excellent corrosion performance and dense coating

Active Publication Date: 2021-03-05
INST OF METAL RESEARCH - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, Kr and Xe are extremely expensive and rare gases, making it difficult to popularize and apply them.
In addition, from the research of S.Myers in the United States, it can be concluded that when Ar gas is used as the sputtering gas, the temperature of the substrate needs to exceed 375°C to obtain α-Ta (Surface and Coatings Technology 214 (2013) 38-45). The temperature is still high, which will reduce the mechanical properties of steel materials

Method used

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  • Preparation method and application of a low-temperature sputtering α-ta coating in a large aspect ratio inner cavity
  • Preparation method and application of a low-temperature sputtering α-ta coating in a large aspect ratio inner cavity

Examples

Experimental program
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Effect test

Embodiment 1

[0025] Using a cylindrical tantalum target with a diameter of 150mm and a large aspect ratio (13:1) inner cavity as the substrate, and a target purity of 99.99wt%, the diameter of the inner cavity with a large aspect ratio is the same as that of the target The diameter difference of the outer wall is 60mm (after adjusting the process parameters, the inner wall of the substrate can be placed within the negative glow area), and the inner cavity with a large aspect ratio is degreased and cleaned on the surface, then loaded into a cylindrical target and connected to a vacuum unit; Draw below 2×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 150°C, and then pump the background vacuum to 7×10 -3 Pa. Infuse argon to 4.0×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 3.3W / cm 2 , the deposition time is 12 hours.

[0026] Observing the cross section and surface of the deposited tantalum coating, it can...

Embodiment 2

[0028] The inner cavity with a diameter of 150mm and a large aspect ratio (aspect ratio of 20:1) is used as the substrate, the purity of the tantalum target is 99.99wt%, and the diameter difference between the inner cavity with a large aspect ratio and the outer wall of the target is 65mm (adjust the process parameters Finally, the inner wall of the matrix can be placed within the range of the negative glow area), and the inner cavity with a large aspect ratio is degreased and cleaned on the surface, and then loaded into a cylindrical target and connected to a vacuum unit; -2 Pa, turn on the heater, heat the surrounding of the sample to 250°C, and then pump the background vacuum to 5×10 -3 Pa. Inject argon to 2.5×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 5W / cm 2 , the deposition time is 12 hours.

[0029] Observation of the cross-section and surface of the deposited tantalum coating shows that the coating ha...

Embodiment 3

[0031] The inner cavity with a diameter of 125mm and a large aspect ratio (aspect ratio of 15:1) is used as the substrate, the purity of the tantalum target is 99.99wt%, and the diameter difference between the inner cavity with a large aspect ratio and the outer wall of the target is 55mm (adjust the process parameters Afterwards, the inner wall of the matrix can be placed within the scope of the negative glow area), the inner wall of the barrel is degreased and cleaned, and then loaded into a cylindrical target and connected to a vacuum unit; the inner wall of the barrel is vacuumed to less than 3×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 200°C, and then pump the background vacuum to 4×10 - 3 Pa. Inject argon to 6.0×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 2.6W / cm 2 , a deposition time of 4 hours.

[0032] Observation of the cross-section and surface of the deposited tantalum coa...

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Abstract

The invention discloses a preparation method and application of a magnetron sputtering α-Ta coating in a cavity with a large aspect ratio, and belongs to the technical field of magnetron sputtering coating. In this method, the inner cavity with large aspect ratio is used as the vacuum cavity, and the cylindrical magnetron target is used as the deposition source, which is extended into the inner cavity for deposition, and the diameter difference between the outer wall of the target and the large aspect ratio should be controlled within 50-65mm. During the period, after adjusting the parameters of the magnetron sputtering, the surface of the inner wall of the tube is in the negative glow area of ​​the glow discharge. The large length-to-diameter ratio pipe fittings are heated to between 150 and 250 °C. The power supply used is DC power supply or pulse power supply, the target material is pure tantalum, the working gas is Ar, and the sputtering power density is 2.5W / cm 2 ~10W / cm 2 between. The invention can deposit 100% α-Ta coating, and its binding force and ablation resistance are significantly better than conventional electroplating chrome coatings, so as to replace the chrome plating process used in large quantities at the present stage that seriously pollutes the environment.

Description

Technical field: [0001] The invention relates to the technical field of material science, in particular to a preparation method and application of a low-temperature sputtering α-Ta coating in a large aspect ratio inner cavity. Background technique: [0002] As early as the late 1980s, the U.S. military took the lead in using magnetron sputtering α-Ta coating for protection. However, when Ar was used as the sputtering gas, the deposition temperature of the barrel had to reach 400°C to realize the α-Ta coating in the coating. The phase structure is 100% α-Ta (Surface and Coatings Technology 120-121 (1999) 44-52). Below this temperature, the phase structure in the coating is mainly β phase, and the α phase cannot be completely formed. In addition, the U.S. military also proposed to use two inert gases, Kr and Xe, as sputtering gases, and at a deposition temperature of 100-200°C, a 100% α-Ta coating can also be deposited (Surface and Coatings Technology 146-147( 2001) 344-350)....

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/14C23C14/04
Inventor 朱圣龙牛云松陈明辉王福会
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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