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Continuous multi-station curved face polisher sand liquid circulating and protecting device

A protective device and polishing machine technology, which is applied in the direction of grinding/polishing equipment, manufacturing tools, metal processing equipment, etc., can solve the problems that affect the processing accuracy and troublesome cleaning, and achieve improved recovery rate, reduced deposition, and high-efficiency sand liquid loop effect

Pending Publication Date: 2019-03-01
宇晶机器(长沙)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the rapid development of automation and intelligence of grinding and polishing equipment, polishing equipment has begun to develop into multi-stations, realizing the non-stop continuous polishing requirements of different processes, but the large-area working area will make cleaning very troublesome, and Too much sand deposition will affect the machining accuracy

Method used

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  • Continuous multi-station curved face polisher sand liquid circulating and protecting device
  • Continuous multi-station curved face polisher sand liquid circulating and protecting device
  • Continuous multi-station curved face polisher sand liquid circulating and protecting device

Examples

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Effect test

Embodiment

[0022] Referring to the accompanying drawings, a continuous multi-station curved surface polishing machine sand liquid circulation and protection device includes 4 station units 7, one of which is a loading and unloading station, and the remaining 3 station units 7 are Working station, each station unit 7 includes three rotary assemblies 8, the rotary assembly 8 passes through the hole corresponding to the station liquid shield 5 (the station liquid shield 5 is the prior art), and the station The station liquid retaining cover 5 is installed correspondingly to the station liquid receiving basin 3 (the station liquid receiving basin 3 is the prior art), and the outer edge of the station liquid retaining cover 5 is placed in the station liquid receiving basin 3. The station unit 7 corresponds to the upper plate unit 9, and the upper plate liquid shield 6 of the upper plate unit 9 is vertically facing the liquid receiving basin 3 of the station. When working, the upper plate liqui...

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Abstract

A continuous multi-station curved face polisher sand liquid circulating and protecting device comprises two or more station units. One station unit is a material taking and putting station, and otherstation units are working stations. Each station unit comprises rotating assemblies, wherein the rotating assemblies penetrate through hole stations corresponding to a station liquid resisting cover,the station liquid resisting cover and a station liquid collecting pot are correspondingly installed, the outer edge of the station liquid resisting cover is arranged in the station liquid collectingpot, the station unit corresponds to an upper disk unit, and an upper disk liquid resisting cover of the upper disk unit perpendicularly and right opposite to the station liquid collecting pot. The station liquid collecting pots are evenly distributed on a large liquid resisting cover and are locked from the inner side of the large liquid resisting cover, the outer edge of the large liquid resisting cover is arranged in a large liquid collecting pot, and a sand outlet of the station liquid collecting pot is aligned to a sand flowing groove of the large liquid collecting pot. The two sides of anotch of the large liquid collecting pot are fixedly connected with the two sides of an opening of the front liquid resisting cover. By means of the continuous multi-station curved face polisher sandliquid circulating and protecting device, sand liquid splashing can be effectively protected, the sand liquid flowing area is reduced, sand liquid waste is reduced, and sand liquid circulation can beefficiently achieved.

Description

technical field [0001] The invention relates to grinding and polishing equipment, in particular to a sand liquid circulation and protection device for a continuous multi-station curved surface polishing machine. Background technique [0002] During the working process of the grinding and polishing equipment, because the sand liquid tends to splash to the entire work table with the rotary motion of the workstation, it is easy to cause sand liquid deposition and environmental pollution. During the working process, it is necessary to continuously replenish sand liquid and manually clean up in time. With the rapid development of automation and intelligence of grinding and polishing equipment, polishing equipment has begun to develop into multi-stations, realizing the non-stop continuous polishing requirements of different processes, but the large-area working area will make cleaning very troublesome, and Excessive deposition of sand liquid will affect the machining accuracy. T...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B57/02B24B57/00B24B27/00
CPCB24B27/0023B24B27/0069B24B57/00B24B57/02
Inventor 杨佳葳杨宇李冬初杨璞
Owner 宇晶机器(长沙)有限公司
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