Luminescence display appliance, etching method and display device

Abstract

The invention discloses a luminescence display appliance, an etching method and a display device. The etching method comprises the steps: to-be-etched metal film layers are coated with photoresist, exposed and developed; the metal layers are etched through preset etching conditions; and the preset etching conditions comprise one or more of etching gas and the power of a bias power supply, whereinthe etching gas comprises boron trichloride with the flow rate being larger than 60 sccm and argon, and the power of the bias power supply is larger than or equal to 300 W. Physical etching can be enhanced through the etching conditions, etched by-products growing on the etched side walls after a reaction between chlorine and metal can be effectively removed by enhancing physical etching, thus filling of subsequent film layers is facilitated, the electrical property of the metal film layers and the film forming quality of the subsequent film layers are improved, thus the product yield is increased, and the product reliability is improved; and removing of the by-products on the side walls of the metal film layers can be further enhanced.

Description

Technical field [0001] The present invention relates to the field of display technology, in particular to a light-emitting display device, an etching method thereof, and a display device. Background technique [0002] In the traditional OLED display field, chlorine-based gas is usually used to etch the metal layer in the OLED display device, such as aluminum (Al), titanium (Ti), and other metals to achieve a better etching effect. With the continuous emergence of new technologies and new layouts, the pattern density of products gradually increases, and the appearance of lines gradually becomes more complicated. [0003] When the existing chlorine-based gas is used to etch the metal layer in the OLED display device, the electrical performance of the metal film layer will decrease, and the subsequent film formation quality will decrease, which seriously affects the yield and reliability of the device. Summary of the invention [0004] In view of this, the embodiments of the present i...

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Problems solved by technology

[0003] When the existing chlorine-based gas is used to etch the metal layer in the OLED display device, the electrical properties of the metal film layer will decrease, and the quality of the subsequent film formation will decrease, which will seriously affect the yield and reliability of the device.

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