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Catalytic removal of antibiotics using carbon nitride/nitrogen-doped hollow mesoporous carbon/bismuth trioxide ternary z-type photocatalyst

A technology of bismuth trioxide and photocatalyst, applied in physical/chemical process catalysts, chemical instruments and methods, chemical/physical processes, etc., can solve the problems of easy precipitation, low photogenerated electron-hole recombination rate, and limited photocatalytic degradation Widely used and other issues to achieve efficient degradation effect

Active Publication Date: 2020-07-03
HUNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in previous studies, the photocatalysts used for photocatalytic degradation still have the following problems: low light utilization efficiency, fast photogenerated electron-hole recombination, poor photocatalytic performance, poor stability (easy to precipitate), etc. The existence of a large number of defects greatly limits the widespread application of photocatalytic degradation
Therefore, how to comprehensively improve the existing problems and defects in the existing photocatalytic degradation technology, and obtain a photocatalytic material with strong light absorption ability, low photogenerated electron-hole recombination rate, and good photocatalytic performance to achieve rapid and efficient detoxification of antibiotics It is of great significance to expand the application range of photocatalytic degradation technology in the treatment of antibiotics

Method used

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  • Catalytic removal of antibiotics using carbon nitride/nitrogen-doped hollow mesoporous carbon/bismuth trioxide ternary z-type photocatalyst
  • Catalytic removal of antibiotics using carbon nitride/nitrogen-doped hollow mesoporous carbon/bismuth trioxide ternary z-type photocatalyst
  • Catalytic removal of antibiotics using carbon nitride/nitrogen-doped hollow mesoporous carbon/bismuth trioxide ternary z-type photocatalyst

Examples

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Embodiment 1

[0046] A method for catalytically removing antibiotics by using carbon nitride / nitrogen-doped hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst, specifically for catalytically removing tetracycline hydrochloride in water, comprising the following steps:

[0047] Add 100 mg of carbon nitride / nitrogen-doped hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst to 100 mL of tetracycline hydrochloride (TCH) solution with a concentration of 10 mg / L, mix well, and store in the dark , adsorb tetracycline hydrochloride under the conditions of 30°C and 600 rpm, and reach adsorption equilibrium after 30 min; place the mixed solution after reaching the adsorption equilibrium under a xenon lamp (λ >420 nm), and carry out under the conditions of 30°C and 600 rpm The photocatalytic reaction lasted for 60 min, and the treatment of TCH was completed.

[0048] With graphite phase carbon nitride (CN), bismuth trioxide (BO), graphite phase carbon nitride / bis...

Embodiment 2

[0073] A method for catalytically removing antibiotics by using carbon nitride / nitrogen-doped hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst, specifically for catalytically removing ciprofloxacin hydrochloride in water, comprising the following steps:

[0074] Add 100 mg of carbon nitride / nitrogen-doped hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst to 100 mL of ciprofloxacin hydrochloride (CFH) solution with a concentration of 10 mg / L, mix well, and Under dark conditions, ciprofloxacin hydrochloride was adsorbed at 30°C and 600 rpm, and adsorption equilibrium was reached after 30 min; The photocatalytic reaction was carried out at 600 rpm for 60 min to complete the treatment of ciprofloxacin hydrochloride.

[0075] With graphite phase carbon nitride (CN), bismuth trioxide (BO), graphite phase carbon nitride / bismuth oxide (CB), graphite phase carbon nitride / nitrogen-doped hollow mesoporous carbon (CH), trioxide Bibismuth / nitroge...

Embodiment 3

[0079] Investigation on the stability of carbon nitride / nitrogen-doped hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst for the removal of antibiotics from water

[0080] The first group: investigate the stability of carbon nitride / nitrogen-doped hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst to remove tetracycline hydrochloride in water, including the following steps:

[0081] (1) Add 100 mg of carbon nitride / nitrogen-doped hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst to 100 mL of tetracycline hydrochloride (TCH) solution with a concentration of 10 mg / L, mix well, and Under dark conditions, adsorb tetracycline hydrochloride at 30°C and 600 rpm, and reach adsorption equilibrium after 30 minutes; place the mixed solution that has reached adsorption equilibrium under a xenon lamp (λ > 420 nm), at 30°C, 600 rpm The photocatalytic reaction was carried out for 60 min to complete the treatment of TCH.

[0082] ...

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Abstract

The invention discloses a method for utilizing a carbon nitride / nitrogen doped mesoporous carbon / bismuth trioxide ternary Z-type light catalyst to catalyze and remove antibiotics. The method adopts the hollow carbon / nitrogen doped mesoporous carbon nitride / bismuth trioxide ternary Z-type photocatalyst to treat antibiotics, the hollow carbon / nitrogen doped mesoporous carbon nitride / bismuth trioxideternary Z-type photocatalyst uses graphite-phase carbon nitride as a carrier, and its surface is modified with nitrogen doped hollow mesoporous carbon and bismuth oxide. The method utilizes the carbon nitride / nitrogen doped mesoporous carbon / bismuth trioxide ternary Z-type light catalyst to conduct photocatalytic degradation on the antibiotics, can effectively remove different types of antibiotics, has the advantages of high removal rate, quick removal, easy implementation, high safety, low cost, no secondary pollution and the like, in particular can achieve efficient removal of antibiotics in water and has a very good practical application prospect.

Description

technical field [0001] The invention belongs to the technical field of sewage treatment, and relates to a method for catalytically removing antibiotics by using carbon nitride / nitrogen doped hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst, in particular to a method for using carbon nitride / nitrogen doped Hollow mesoporous carbon / bismuth trioxide ternary Z-type photocatalyst for catalytic removal of antibiotics in water. Background technique [0002] Antibiotics are a class of secondary metabolites produced by microorganisms (including bacteria, fungi, and actinomycetes) or higher animals and plants in the course of life, which have anti-pathogen or other activities, and can interfere with the development and function of other living cells. chemicals. In recent decades, due to the widespread use of antibiotics in medicine, animal husbandry and aquaculture, etc., excessive and incomplete metabolism make antibiotics often detected in natural water, sewag...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J27/24C02F103/34
CPCB01J27/24B01J35/004C02F1/30C02F1/725C02F2103/343C02F2305/023C02F2305/10
Inventor 刘智峰邵彬彬曾光明刘洋蒋艺林刘玉杰张魏何清云唐旺旺
Owner HUNAN UNIV
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