Semiconductor waste gas treatment equipment reaction cavity support

Abstract

The invention relates to the technical field of waste gas treatment equipment, in particular to a semiconductor waste gas treatment equipment reaction cavity support. The semiconductor waste gas treatment equipment reaction cavity support comprises an installing plate and a bearing plate, the bearing plate is fixedly welded to the outer side wall of a cavity body of a reaction cavity, the bearingplate comprises an arc-shaped plate welded to the outer side wall of the cavity body of the reaction cavity, and connecting plates are integrally arranged at the upper and lower ends of the arc-shapedplate and are connected with arms through bolts arranged in a through manner. The semiconductor waste gas treatment equipment reaction cavity support has the beneficial effects that the rotating angle can reach 300 degrees, and the cavity body can completely enters and exists from a machine table; touch with other parts of the machine table can be easily avoided, and damage to the parts is avoided; and a plastic liner is installed, so that the cavity body is rotated more easily and freely. By means of the device, connection through a lock pin is achieved, and dismounting and mounting are facilitated. The cavity body can be moved up and down more easily, and the aim of conveniently dismounting and mounting the cavity body is achieved. The device is firm in structure, safe, reliable, capable of achieving operation by one person and capable of saving manpower.

Description

technical field [0001] The invention relates to the technical field of waste gas treatment equipment, in particular to a support for a reaction chamber of semiconductor waste gas treatment equipment. Background technique [0002] 1. The high temperature and violent chemical reaction inside the reaction chamber of exhaust gas treatment equipment have very strict requirements on the material of the chamber. In order to achieve better treatment effect and prolong the service life, the designed chamber is generally heavy in weight and large in volume. The reaction chamber is installed above the water tank. The water tank is generally made of corrosion-resistant plastic material, which cannot bear the pressure of heavy objects and cannot withstand high temperatures. Even if it is replaced with a metal material, corrosion cannot be avoided. Above the water tank, the water tank will collapse due to gravity or high temperature corrosion, causing waste gas and waste water to leak out...

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a reaction chamber support for semiconductor waste gas treatment equipment to solve the problems of poor adjustment ability between the slide rail type and the fixed type, poor carrying capacity, short service life, and laborious disassembly and assembly proposed in the above background technology.

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