Atomic layer deposition device for coating large-scale micro-nano particles

Abstract

The invention belongs to the field related to atomic layer deposition preparation instruments, and discloses an atomic layer deposition device for coating large-scale micro-nano particles. The devicecomprises a particle container and a reaction cavity, wherein a source inlet is formed in the lower end of the reaction cavity, an air inlet pipe used for inputting a precursor and a carrier gas is arranged in the source inlet in a sealed mode, the upper end of the reaction cavity is provided with a cavity door, the particle container can be freely placed in the reaction cavity, or is taken out ofthe reaction cavity, an air inlet hole is formed in the lower end of the particle container, and the air inlet pipe enters an inner cavity of the particle container through the air inlet hole. According to the atomic layer deposition device, the airflow internal circulation method and the airflow external circulation method can be effectively combined, so that the collision between the particlesand the contact probability between the particles and gas molecules are remarkably increased, the reaction rate and the precursor utilization rate are improved, and high-quality and high-efficiency coating of the large-scale micro-nano particles is realized.

Description

technical field [0001] The invention belongs to the related field of atomic layer deposition preparation equipment, and more specifically relates to an atomic layer deposition device for encapsulating large quantities of micro-nano particles. Background technique [0002] Due to the relatively larger specific surface area than ordinary materials, micro-nano-sized particle materials have physical and chemical properties different from those on the general macro-scale, and are widely used in fuels, coatings, electronics, catalysts, etc. field. However, micro-nano particles have disadvantages such as easy agglomeration and oxidation. Therefore, it is considered to coat the surface of the particles with a protective film to overcome the above defects. At present, the coating methods for particles generally include solid-phase method, liquid-phase method and gas-phase method. Among them, atomic layer deposition, as a special chemical vapor deposition method, has excellent unifor...

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Problems solved by technology

[0003] However, further studies have shown that the above-mentioned existing technologies still have the following defects or deficiencies: First, the current atomic deposition technology is usually only applied to the wrapping of planar substrates, and there is insufficient research on the wrapping of particles, especially micro-nano particles; Secondly, and more importantly, in practice, it is found that micro-nanoparticles have a large specific surface area and are prone to agglomeration. Using conventional atomic layer deposition equipment or methods is not only difficult to achieve uniform and complete encapsulation of micro-nanoparticles, but also the deposition process It is necessary to consume a large amount of precursors in the process, it is difficult to achieve industrialized mass production, and there are problems such as inconvenient manipulation and difficulty in obtaining the required indicators accurately.

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