Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Varnish for photoalignment film and liquid crystal display device

A technology of photo-alignment film and varnish, applied in optics, nonlinear optics, coatings, etc., can solve the problems of reliability decline of liquid crystal display devices

Active Publication Date: 2018-10-23
JAPAN DISPLAY INC
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the film strength of the alignment film decreases, the sealing portion bonded to the alignment film will be easily peeled off, resulting in a decrease in the reliability of the liquid crystal display device.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Varnish for photoalignment film and liquid crystal display device
  • Varnish for photoalignment film and liquid crystal display device
  • Varnish for photoalignment film and liquid crystal display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～3 and comparative example 1、2

[0156] To the polyamic acid-based compounds in Table 1 above, alkoxysilanes as shown in Table 2 below were added (may not be added) and stirred until uniform to prepare respective coating liquids. exist figure 1 and figure 2 In the liquid crystal display device having the structure shown, each coating liquid is applied on the area where the first alignment film AL1 should be applied on the first substrate SUB1 and the area where the second alignment film AL2 should be applied on the second substrate SUB2, and heated. Imidation is carried out at 200°C. The imidization ratios were all 80%. For each imidized film, photo-alignment treatment was performed using short-wavelength ultraviolet light. After washing each alignment film, using the first substrate SUB1 on which the first alignment film AL1 was formed and the second substrate SUB2 on which the second alignment film AL2 was formed as described above, a conventional method was used to fabricate figure 1 The liquid crysta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a varnish for photoalignment film and a liquid crystal display device. According to one embodiment, the varnish for a photo-alignment film contains an alkoxysilane and a firstpolyamic acid-based compound in an organic solvent. The first polyamic acid compound is a polyamic acid or a polyamic acid ester. The aforementioned alkoxysilane does not contain a primary amino group and a secondary amino group.

Description

[0001] This application is based on and claims the benefit of priority of Japanese Patent Application No. 2017-071665 filed on March 31, 2017, and the entire contents of this application are incorporated herein as constituting a part of this specification. technical field [0002] Embodiments of this invention generally relate to the varnish for photo-alignment films, and a liquid crystal display device. Background technique [0003] A liquid crystal display device has two substrates (a first substrate and a second substrate) disposed opposite to each other. The first substrate has a first region and a second region. On the other hand, the second substrate faces the first region of the first substrate but does not face the second region of the first substrate. That is, the second region of the first substrate protrudes outward from the edge of the second substrate. A pixel electrode, a thin film transistor, and the like are provided on a first region of the first substrate,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C09D179/08C09D7/63G02F1/1337
CPCC08K5/5435C09D179/08C09D7/63G02F1/133723
Inventor 广田武德园田英博
Owner JAPAN DISPLAY INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com