Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Atomic layer deposition online monitoring system

An atomic layer deposition and monitoring system technology, applied in coating, metal material coating process, gaseous chemical plating, etc., can solve the problems of passive and delayed risk, insufficient effective monitoring and recording, and rigid maintenance process.

Pending Publication Date: 2018-08-21
JIANGSU MICROVIA NANO EQUIP TECH CO LTD
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the continuous development of modern science and technology, the application of ALD in industrial mass production is becoming more and more mature, but the effective monitoring and recording of the industrial stability of ALD mass production equipment is still not perfect, and the production line can only rely on the analysis of the results Only when there is a problem with the equipment process can the risk monitoring be passive and delayed, and the maintenance process is rigid, and it is impossible to carry out targeted and reasonable maintenance according to the actual long-term process conditions. Therefore, an effective online monitoring system is urgently needed to monitor the equipment on the production line. Process stability monitoring and long-term records

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Atomic layer deposition online monitoring system
  • Atomic layer deposition online monitoring system
  • Atomic layer deposition online monitoring system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Such as figure 1 As shown, the monitoring system is provided with detection elements, signal conversion devices, signal processing systems, process control systems and central data processing systems; During the atomic layer deposition process, the vacuum pump is always in working condition, and the gas in the reaction chamber will always flow through the pump chamber tube.

[0032] In the process of mass production, the signal conversion device is a mass spectrometer, and the mass spectrometer will be connected to the cavity pump tube through the flange interface. When the relevant particles pass through, they will enter the detection element, enter the detection element in sequence according to the mass-to-charge ratio, and pass through the signal conversion device. The signal is converted into an electrical signal; it is drawn into a mass spectrogram through the signal processing system, and finally recorded in the central data processing system.

[0033] Under norm...

Embodiment 2

[0037] Such as figure 2 As shown, the monitoring system is provided with a detection element, a signal conversion device, a signal processing system, a process control system and a central data processing system; the detection element is arranged in the reaction chamber.

[0038] In the process of mass production, the signal conversion device uses ellipsometer to fix the light source, detection element and other auxiliary facilities inside the equipment. The light after the interference of the light source passes into the detection element, and the light is converted into an electrical signal by the signal conversion device ; and draw a film thickness change map through the signal processing system. Finally recorded in the central data processing system.

[0039] Under normal circumstances, the image drawn by the signal processing system will be fitted with the theoretical image formed by the process parameters provided by the process control system, such as Figure 6 ;

...

Embodiment 3

[0044]The difference between embodiment 3 and embodiments 1 and 2 is that the detection element is a piezoelectric material, and the signal conversion device is composed of an oscillating circuit, a frequency counter and a controller. The function of the signal conversion device is to convert the physical changes on the piezoelectric material It is an identifiable electrical signal; the piezoelectric material is set at the air flow of the atomic layer deposition equipment, the atomic layer is deposited on the piezoelectric material, the piezoelectric material produces a piezoelectric effect, and the piezoelectric material converts physical changes into electrical signals, and The electrical signal is transmitted to the signal processing system; the process control system transmits the real-time theoretical process state to the signal processing system, and the signal processing system matches the real-time process state with the theoretical process state, and monitors the proces...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an atomic layer deposition online monitoring system. The monitoring system is provided with a detecting element, a signal converting device, a signal processing system and a process control system. The detecting element is installed at an airflow flowing place of an atomic layer deposition device. The detecting element is connected with the signal converting device. The signal converting device is capable of converting a signal of the detecting element. The signal processing system is connected with the signal converting device and the process control system. The signalconverting device is capable of conveying a real-time process state to the signal processing system. The process control system is capable of conveying a real-time theory process state to the signalprocessing system. The signal processing system is capable of fitting the real-time process state and the real-time theory process state, and monitoring the process state in real time.

Description

technical field [0001] The invention relates to the technical field of solar cell manufacturing equipment, in particular to a device for on-line monitoring and recording process stability of atomic layer deposition. Background technique [0002] Atomic layer deposition (ALD) is a method that can coat substances layer by layer on the surface of a substrate in the form of a single atomic film. Atomic layer deposition is similar to ordinary chemical vapor deposition. But in ALD, the chemical reaction of a new atomic film is directly linked to the previous one, in such a way that only one layer of atoms is deposited per reaction. This deposition technique was first proposed by Finnish scientists in the 1970s. [0003] At present, atomic layer deposition (ALD) technology, as one of the most advanced thin film deposition technologies, has been widely used in foreign advanced high-tech manufacturing industries. With the continuous development of modern science and technology, th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/52C23C16/455
CPCC23C16/45525C23C16/52
Inventor 黎微明李翔赵昂璧左敏糜珂
Owner JIANGSU MICROVIA NANO EQUIP TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com