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A kind of preparation method of ternary semiconductor catalyst

A catalyst and semiconductor technology, applied in the field of preparation of ternary semiconductor catalysts, can solve the problem of low separation efficiency of photogenerated carriers

Active Publication Date: 2019-12-13
XUZHOU UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to achieve the above object, the present invention provides a method for preparing a ternary semiconductor catalyst, which solves the problem of low separation efficiency of photogenerated carriers in the existing photocatalyst preparation method

Method used

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  • A kind of preparation method of ternary semiconductor catalyst
  • A kind of preparation method of ternary semiconductor catalyst
  • A kind of preparation method of ternary semiconductor catalyst

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preparation example Construction

[0032] A kind of preparation method of ternary semiconductor catalyst of the present invention, specifically carry out according to the following steps:

[0033] Step 1: Add 1 to 3 mmol of benzoyl peroxide to a mixture of 8 to 30 mL of acetone and 2-methoxyethanol and stir evenly; then add 0.2 to 0.5 mL of methacrylic acid and 0.4 ~ 1mL isopropyl titanate, continue to stir to obtain a light yellow solution;

[0034] Step 2,

[0035] Continue to add bismuth nitrate pentahydrate to the light yellow solution obtained in step 1, stir until the solution is uniform, and heat at 120°C for 60 minutes to obtain the precursor P 0 ;

[0036] Step 3,

[0037] In a 4kW ceramic fiber muffle furnace, react 0.8-2.0g of dicyandiamide at 540°C for 2h at a heating rate of 7°C / min, and naturally cool to room temperature to obtain light yellow g-C 3 N 4 ;

[0038] Step 4,

[0039] 1g precursor P obtained in step 2 0 Add to the g-C prepared in step 3 3 N 4 After grinding and mixing evenly...

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Abstract

The invention discloses a preparation method of a ternary semiconductor catalyst. The method specifically comprises the steps as follows: step 1, 1-3 mmol of benzoyl peroxide is added to a mixed solvent of 8-30 mL of acetone and 2-methoxyethanol, 0.2-0.5 mL of methacrylic acid and 0.4-1 mL of isopropyl titanate are sequentially added to the mixed solution, and a light yellow solution is obtained;step 2, after bismuth nitrate pentahydrate is added to the solution obtained in the step 1, the obtained solution is heated at 120 DEG C for 60 min, and a precursor P0 is obtained; step 3, g-C3N4 obtained with a thermal polymerization method is mixed with the P0 in the mass ratio smaller than 2, the obtained mixture is heated at 540 DEG C for 2 h in a tubular furnace where N2-O2 mixed gas is intermittently introduced, and the ternary catalyst is obtained. A heterostructure is constructed to avoid composition of photon-generated carriers, so that the photocatalytic performance of semiconductorsis improved to a certain extent.

Description

technical field [0001] The invention belongs to the technical field of industrial catalysis and relates to a preparation method of a ternary semiconductor catalyst. Background technique [0002] The amount of pollutants in my country's chemical production wastewater is large and the structure is complex. Targeted and efficient treatment of chemical wastewater is of great significance to the development of chemical companies and environmental protection. Finding ways to efficiently remove pollutants in wastewater is crucial to the survival of chemical companies and development also play a crucial role. [0003] Photocatalytic technology uses natural light as excitation, which has the advantages of economy and environmental protection. It achieves a special catalytic effect through the interface of pollutant molecules, so that the surrounding oxygen and water molecules are excited into free negative ions with great oxidative power, so as to achieve the degradation of harmful su...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J27/24
CPCB01J27/24B01J35/004
Inventor 李靖杨华美堵锡华宋明王晓辉王绍荣
Owner XUZHOU UNIV OF TECH
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