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Post-processing method of mask plate and mask plate

A technology for mask and electrolytic treatment, which is applied to the post-processing method of mask and the field of mask, and can solve problems such as unfavorable application

Inactive Publication Date: 2018-07-06
KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the blocking of the etched convex part, the second region 120' can only be evaporated once, which is a non-ideal film thickness region, which is not conducive to application

Method used

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  • Post-processing method of mask plate and mask plate
  • Post-processing method of mask plate and mask plate
  • Post-processing method of mask plate and mask plate

Examples

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Embodiment Construction

[0030] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. In the following description, many specific details are explained in order to fully understand the present invention. However, the present invention can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present invention. Therefore, the present invention is not limited by the specific embodiments disclosed below.

[0031] See Figure 2 ~ Figure 5 , The post-processing method of the mask of an embodiment includes the following steps:

[0032] S10. A mask 100 is provided, and the surface of the mask 100 has a convex portion 120.

[0033] The surface of the mask 100 includes the vapor deposition surf...

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Abstract

The invention relates to a post-processing method of a mask plate and the mask plate. The post-processing method of the mask plate comprises the following steps that the mask plate is provided, wherein the surface of the mask plate is provided with a convex portion; and at least one part of the convex portion of the mask plate is subjected to electrolytic treatment. By means of the post-processingmethod of the mask plate, the redundant convex portion located on the surface of the mask plate can be effectively removed or thinned. The mask plate is obtained by adopting the post-processing method. By reducing at least one part of the convex portion on the side wall face of an upper opening of the mask plate, blocked evaporation sources can be reduced, the evaporation effective area can be increased, the design margin can be reduced, the opening rate is increased, and high PPI product application is facilitated. In addition, burrs and corner affecting effects can be reduced.

Description

Technical field [0001] The present invention relates to the field of display technology, in particular to a post-processing method of a mask and a mask. Background technique [0002] Flat panel display devices have many advantages such as thin body, power saving, and no radiation, and have been widely used. Existing flat panel display devices mainly include Active-matrix organic light emitting diode (AMOLED) and Organic Light Emitting Display (OLED). The production of flat panel display devices involves the process of forming a thin film pattern on a substrate, that is, using a patterned vapor deposition mask mask, and forming the required pattern on the substrate to be vapor deposited by vacuum vapor deposition. [0003] The traditional mask is made by double-sided etching process, please refer to figure 1 A number of openings are formed in the manufactured mask 100', and each of the openings is formed by etching both sides of the mask to a certain depth at the same time, so that...

Claims

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Application Information

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IPC IPC(8): C23C14/04C23C14/24C25F1/04
CPCC23C14/042C23C14/24C25F1/04
Inventor 刘明星李俊峰周丽芳高峰
Owner KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
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