Method for improving exposure area of 4-inch mask manufactured through step-and-repeat final reaction system

Abstract

The invention relates to a method for improving the exposure area of a 4-inch mask manufactured through a step-and-repeat final reaction system. The method comprises the steps of inputting the exposure area into an exposure area of the mask and building a coordinate system according to the exposure area; exposing a first minification mask according to step pitches in an X-axis direction and a Y-axis direction to obtain a final minification mask; shifting the top row of the exposed final minification mask to obtain an upshifted coordinate; shifting the bottom row of the exposed final minification mask to obtain a down-shifted coordinate; taking the upshifted coordinate as an original point and exposing the upshifted final minification mask according to the step pitches in the X-axis direction and the Y-axis direction; and taking the down-shifted coordinate as the original point and exposing the down-shifted final minification mask according to the step pitches in the X-axis direction and the Y-axis direction. According to the method, the manufactured area of the 4-inch mask is improved, the market requirements are met, the economic benefits are increased, the limitation of equipmentis broken through and the problem that the Y-direction length cannot exceed 76mm under the limitations of a 4-inch mask frame and focusing is solved.

Description

technical field [0001] The invention relates to the field of semiconductor plate making, in particular to a method for increasing the exposure area of ​​a 4-inch plate produced by a step-and-repeat compacting machine. Background technique [0002] Normally, the distance between the left and right frame of the 4-inch mask plate is limited to within 76mm in the X direction. The programming menu can only input one size, which means that the maximum length in X and Y directions is the same value. The maximum length of the program menu for making 4-inch version can only be 76mm. If it exceeds 76mm, the starting point of the machine will focus on the frame in the X direction. , causing flatness problems, making it impossible to make a mask. To make a reticle with a maximum of 76mm in the X direction and more than 76mm in the Y direction, unless you use a 5-inch frame and a 5-inch plate, and then cut it into 4 inches after production, you cannot make a 4-inch reticle that exceeds ...

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies of the prior art, the present invention provides a method for increasing the exposure area of ​​a 4-inch plate produced by a step-and-repeat compacting machine, increasing the area for making a mask, and solving the problem that the Y-direction length cannot be adjusted under the limitation of a 4-inch plate frame and focusing Problems over 76mm

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