Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Coaxial anode insulating pulse plasma thruster

A pulsed plasma, insulating technology, applied in the direction of using plasma, thrust reverser, machine/engine, etc., can solve the problems of insufficient thrust and low density of plasma jet, and achieve high density, good directionality, and reliable thrust. Effect

Active Publication Date: 2018-06-22
BEIJING JIAOTONG UNIV
View PDF2 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The object of the present invention is to provide a kind of coaxial type anode insulation type pulsed plasma thruster that can improve plasma jet density and jet directivity, to solve the traditional plasma thruster plasma jet density that exists in the above-mentioned background technology is not high, Technical issues with insufficient thrust

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Coaxial anode insulating pulse plasma thruster
  • Coaxial anode insulating pulse plasma thruster
  • Coaxial anode insulating pulse plasma thruster

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with the drawings are exemplary, and are only used to explain the present invention, but not to be construed as limiting the present invention.

[0029] Those skilled in the art will understand that unless otherwise stated, the singular forms "a", "an", "said" and "the" used herein may also include plural forms. It should be further understood that the word "comprising" used in the description of the present invention refers to the presence of said features, integers, steps, operations, elements and / or components, but does not exclude the presence or addition of one or more other features, Integers, steps, operations, elements and / or groups thereof. It should be understood that "con...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Lengthaaaaaaaaaa
Login to View More

Abstract

The invention discloses a coaxial anode insulating pulse plasma thruster and relates to the technical field of microsatellite thrusters. The coaxial anode insulating pulse plasma thruster comprises acathode, an anode and an insulating barrel sleeving the cathode, wherein the cathode is cylindrical, a discharge end is arranged at the front end of the cathode, the anode is of a cylindrical structure fixed to the outer wall of the insulating barrel, and the inner wall of the anode is in contact with the outer wall of the insulating barrel; an insulating layer wraps the outer surface of the anode; axes of the cathode, the anode and the insulating barrel are superposed; the cylindrical end of the cathode is electrically connected to a negative high voltage terminal of an external circuit; andthe anode is grounded. The anode is wrapped by means of the insulating barrel and the insulating layer, so that a passage where plasmas move toward the anode is blocked, and more plasmas are ejected axially along the insulating barrel, and therefore, the density of a plasma jet is improved. By arranging the insulating barrel, the plasmas under the action of hump potential are ejected axially alongthe insulating barrel to form the plasma jet which is high in energy and good in directionality.

Description

technical field [0001] The invention relates to the technical field of micro-satellite thrusters, in particular to a coaxial anode-insulated pulse plasma thruster. Background technique [0002] Vacuum gap discharge can generate high-energy, high-density metal ion plasma. The generated plasma can be applied to ion implantation technology to change the surface properties of materials; it can also be applied to pulsed plasma thrusters to provide power for attitude adjustment of micro-satellites. [0003] In the vacuum gap discharge, the electrons collide with the metal vapor from the cathode point under the action of field emission to generate metal ions and electrons. Then, the electrons move to the anode, and the metal ions will gather near the cathode, thereby forming a positive higher space potential (hump potential) near the cathode. Under the effect of hump potential, metal ions drag electrons to move in all directions. [0004] The traditional vacuum gap discharge pla...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): F03H1/00
CPCF03H1/0087
Inventor 田甲刘文正崔伟胜徐旻赵潞翔
Owner BEIJING JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com