Laser splicing pattern structure and its etching wiring method
A wiring method and etching line technology, which is applied in the directions of instruments, calculations, electrical digital data processing, etc., can solve problems such as short circuit and limited laser distance at one time, and achieve the effects of ensuring splicing accuracy, avoiding splicing deviation, and improving efficiency
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[0026] This embodiment includes a number of ITO pattern units arranged and connected in sequence. Several segments of etched lines in the ITO pattern units are sequentially connected to form several rhombus structures, and the two spliced etched lines at the joint positions are oblique lines.
[0027] Preferably, the rhomboid structure is a centrosymmetric figure.
[0028] In this embodiment, the etching lines at the joint positions are optimized to avoid short circuits caused by splicing deviations. The specific measures are:
[0029] 1) In order to improve the etching efficiency, the positions where the etching lines meet are preset on a row of continuous diamond-shaped structures, and each of the diamond-shaped structures is relative to the horizontal axis of the ITO pattern unit (such as Figure 1C shown) symmetrical setup;
[0030] 2) On each rhombus structure such as figure 2 A right-angled bending structure composed of horizontal etching line 4 and vertical etching...
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