Laser splicing pattern structure and its etching wiring method

A wiring method and etching line technology, which is applied in the directions of instruments, calculations, electrical digital data processing, etc., can solve problems such as short circuit and limited laser distance at one time, and achieve the effects of ensuring splicing accuracy, avoiding splicing deviation, and improving efficiency

Active Publication Date: 2021-12-31
ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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  • Abstract
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AI Technical Summary

Problems solved by technology

The ITO pattern in the touch screen adopts the laser process, but the distance of the laser once is limited and needs to be spliced, so it is impossible to realize such Figure 1C Ideal etched wire routing
There is a problem of splicing deviation in the direct splicing of oblique lines and oblique lines by laser machines, which will cause local short circuits

Method used

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  • Laser splicing pattern structure and its etching wiring method
  • Laser splicing pattern structure and its etching wiring method
  • Laser splicing pattern structure and its etching wiring method

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Embodiment 1

[0026] This embodiment includes a number of ITO pattern units arranged and connected in sequence. Several segments of etched lines in the ITO pattern units are sequentially connected to form several rhombus structures, and the two spliced ​​etched lines at the joint positions are oblique lines.

[0027] Preferably, the rhomboid structure is a centrosymmetric figure.

[0028] In this embodiment, the etching lines at the joint positions are optimized to avoid short circuits caused by splicing deviations. The specific measures are:

[0029] 1) In order to improve the etching efficiency, the positions where the etching lines meet are preset on a row of continuous diamond-shaped structures, and each of the diamond-shaped structures is relative to the horizontal axis of the ITO pattern unit (such as Figure 1C shown) symmetrical setup;

[0030] 2) On each rhombus structure such as figure 2 A right-angled bending structure composed of horizontal etching line 4 and vertical etching...

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PUM

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Abstract

A laser splicing pattern structure and its etching wiring method in the field of touch screen technology, a first etching line and an adjacent second etching line are connected through a first right-angle bending structure at the splicing place; the first etching line and the second etching line The extension lines of the two etching lines coincide. The present invention adopts right-angled horizontal etching lines and vertical etching lines to be connected to the joints of oblique line segments, which can ensure the splicing accuracy of oblique line segments and avoid short circuit caused by splicing deviations.

Description

technical field [0001] The invention relates to a technology in the field of touch screens, in particular to a laser splicing pattern structure and an etching wiring method thereof. Background technique [0002] Such as Figure 1A and 1B Shown are the laser pattern structure diagrams of the ITO upper film and lower film in the touch screen, respectively. The ITO pattern in the touch screen adopts the laser process, but the distance of the laser once is limited and needs to be spliced, so it is impossible to realize such Figure 1C Ideal for etched wire routing. There is a problem of splicing deviation in the direct splicing of oblique lines and oblique lines by laser machines, and this splicing deviation will cause local short circuits. At present, most of the ITO patterns adopt a diamond structure, and oblique splicing is unavoidable, such as figure 2 shown. Contents of the invention [0003] Aiming at the above-mentioned deficiencies in the prior art, the present i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F3/041
CPCG06F3/0412G06F2203/04103
Inventor 李文李兆勇任小勇
Owner ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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