Self-adaptive flexible discharging plasma device

Abstract

In a self-adaptive flexible discharging plasma device, a dielectric body A is arranged at an upper part of a base, a lower surface of the dielectric body A has viscosity, a high-voltage electrode is arranged at an upper part of the dielectric body A and is connected with a high-voltage power supply via a wire, a dielectric body B is arranged on an upper surface of the high-voltage electrode, a lower surface of the dielectric body B has viscosity, a photocatalytic material is arranged on an upper surface of the dielectric body B, a dielectric body C is arranged at an upper part of the photocatalytic material, a lower surface of the dielectric body C has viscosity, a ground electrode is arranged on an upper surface of the dielectric body C, and through holes with same diameters are uniformlyformed in the ground electrode. The self-adaptive flexible discharging plasma device can be applicable to an irregularly-shaped processing object, surface contact discharging process is achieved, energy consumption is low, discharging along a surface can be blocked by a medium, the discharging catalytic recombination processing efficiency is improved, the repeated service lifetime of the self-adaptive flexile discharging plasma device is prolonged, and the processing efficiency of the self-adaptive flexile discharging plasma device is improved.

Description

technical field [0001] The invention relates to a discharge device, especially a flexible discharge device. Background technique [0002] Atmospheric pressure non-equilibrium low-temperature plasma advanced oxidation technology has the characteristics of low discharge gas temperature, strong chemical activity, high processing efficiency, and low energy consumption. focus on. Among them, due to the scalability of the discharge area of ​​creeping discharge, it is easy to form large-area discharge. Therefore, the research and attention of creeping discharge is the focus of the key points. It is currently known that the structure of the creeping discharge device and the parameters of stable discharge determine various factors such as the density of the plasma, the concentration of the active material, and the type of the active species. Different creeping discharge devices can be designed according to the application of different processing objects. However, the existing creep...

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Problems solved by technology

However, the existing creeping discharge device can not meet people's needs due to the problems of low efficiency, high discharge requirements and uneven treatment effect due to the lack of close contact with the discharge surface.

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