Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photosensitive resin waste treatment method and photosensitive resin waste treatment system

A photosensitive resin and waste treatment technology, applied in chemical instruments and methods, solid waste removal, transportation and packaging, etc., can solve problems such as improper treatment of photosensitive resin waste liquid

Active Publication Date: 2018-03-20
广州形优科技有限公司
View PDF9 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a treatment method for photosensitive resin waste, which can effectively treat photosensitive resin waste liquid, solve the problem of improper treatment of photosensitive resin waste liquid, and has the characteristics of being more environmentally friendly
[0005] Another object of the present invention is to provide a photosensitive resin waste treatment system, which can effectively treat photosensitive resin waste liquid, solve the problem of improper treatment of photosensitive resin waste liquid, and has the characteristics of being more environmentally friendly

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive resin waste treatment method and photosensitive resin waste treatment system
  • Photosensitive resin waste treatment method and photosensitive resin waste treatment system
  • Photosensitive resin waste treatment method and photosensitive resin waste treatment system

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0033] see figure 1 and figure 2 , this embodiment provides a photosensitive resin waste treatment method for treating the photosensitive resin waste liquid discharged from the photosensitive resin molding system 10. The photosensitive resin waste liquid is usually composed of oligomers, photoinitiators and diluents, etc. of harmful substances. The photosensitive resin waste treatment method provided in this embodiment can effectively treat the photosensitive resin waste liquid, solve the problem of improper treatment of the photosensitive resin waste liquid, and has the characteristics of being more environmentally friendly.

[0034] It should be noted that the photosensitive resin waste treatment method provided in this embodiment is implemented using the photosensitive resin waste treatment system 100. Before introducing the photosensitive resin waste treatment method provided in this embodiment, the photosensitive resin waste treatment system 100 is first Introduction a...

no. 2 example

[0078] see Figure 1 to Figure 3 , this embodiment provides a photosensitive resin waste treatment system 100 for implementing a photosensitive resin waste treatment method. The photosensitive resin molding system 10 includes a molding device 200, the photosensitive resin waste treatment system 100 includes a flow guiding part 110, a collecting assembly 120 and a curing assembly 130, the collecting assembly 120 includes a waste bag 121 and a sealing member; the waste bag 121 is located at the bottom of the flow guiding part 110 One end, the other end of the flow guide part 110 is used to connect with the molding equipment 200; the seal is used to seal the waste bag 121 containing the photosensitive resin waste liquid; the curing component 130 is arranged around the collecting component 120, and the curing component 130 is used for The ultraviolet light is emitted to irradiate the photosensitive resin waste liquid in the collecting component 120 .

[0079] In this embodiment, ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a photosensitive resin waste treatment method and a photosensitive resin waste treatment system, and relates to the technical field of resin liquid waste treatment. The photosensitive resin waste treatment method comprises the steps that photosensitive resin liquid waste is led into a waste bag; ultraviolet light is used for irradiating the photosensitive resin liquid wastecontained in the waste bag, and therefore the photosensitive resin liquid waste cures to form photosensitive resin waste; and the waste bag is sealed. The invention further provides the photosensitive resin waste treatment system capable of implementing the photosensitive resin waste treatment method. By means of the photosensitive resin waste treatment method and the photosensitive resin waste treatment system, the photosensitive resin liquid waste can be effectively treated, the problem that the photosensitive resin liquid waste is treated improperly is solved, and the beneficial effect ofbeing more environment-friendly is achieved.

Description

technical field [0001] The invention relates to the technical field of resin waste liquid treatment, in particular to a photosensitive resin waste treatment method and a photosensitive resin waste treatment system. Background technique [0002] This section is intended to provide a background or context for implementations of the invention that are set forth in the claims and detailed description. The descriptions herein are not admitted to be prior art by inclusion in this section. [0003] The existing three-dimensional rapid prototyping technology is to use a light source with a specific wavelength to irradiate and cure the photosensitive resin to obtain the required model. The photosensitive resin is composed of oligomers, photoinitiators, and diluents. It is generally liquid at room temperature and can be used to manufacture high-strength, high-temperature-resistant, and waterproof materials. The light source used for curing is ultraviolet light of a certain wavelengt...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B09B3/00C08J3/28C08J3/24
CPCC08J3/24C08J3/28C08J2300/30B09B3/20
Inventor 边疆
Owner 广州形优科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com