Euro gray low-E (low-emissivity) coated glass
A low-emission coating and glass technology, applied in the field of off-line European gray low-emission coated glass, can solve the problems of low-emission energy saving effect, complex manufacturing process, and high visible light transmittance, and achieve easy layout, simple film layer configuration, and production. The effect of improving efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0027] Using vacuum off-line magnetron sputtering coating equipment, on a 6mm high-quality float glass substrate, the underlying layer of silicon nitride Si is sequentially coated from the inside to the outside 3 N 4 30.5nm, metal protective layer nickel chromium NiCr8.0nm, dielectric layer zinc tin oxide ZnSnO30.6nm, zinc oxide ZnO5nm, functional layer copper Cu5.5nm, nickel-chromium alloy protective layer NiCr3.3nm, dielectric layer silicon nitride Si 3 N 4 25nm, dielectric layer zinc tin oxide ZnSnO20.4nm, seed layer zinc oxide ZnO5nm, functional layer silver Ag10.2nm, metal nickel-chromium alloy protective layer NiCr3.1nm, dielectric protective layer Si 3 N 4 37.5nm.
Embodiment 2
[0029] Using vacuum off-line magnetron sputtering coating equipment, on a 6mm high-quality float glass substrate, the underlying layer of silicon nitride Si is sequentially coated from the inside to the outside 3 N 4 , 33.2nm, metal protective layer nickel chromium NiCr, 8.1nm, dielectric layer zinc tin oxide ZnSnO, 28.1nm, zinc oxide ZnO, 5.9nm, functional layer copper Cu, 5.7nm, nickel-chromium alloy protective layer NiCr, 2.9nm, dielectric Silicon Nitride Si 3 N 4 , 24.9nm, dielectric layer zinc tin oxide ZnSnO, 19nm, seed layer zinc oxide ZnO, 5.6nm, functional layer silver Ag, 10.4nm, metal nickel-chromium alloy protective layer NiCr, 2.2nm, dielectric protective layer Si 3 N 4 , 36.4nm.
Embodiment 3
[0031] Using vacuum off-line magnetron sputtering coating equipment, on a 6mm high-quality float glass substrate, the underlying layer of silicon nitride Si is sequentially coated from the inside to the outside 3 N 4 , 34nm, metal protective layer nickel chromium NiCr8.5nm, dielectric layer zinc tin oxide ZnSnO, 29nm, zinc oxide ZnO, 6nm, functional layer copper Cu, 5.8nm, nickel-chromium alloy protective layer NiCr, 2.9nm, dielectric layer silicon nitride Si 3 N 4 , 25.4nm, dielectric layer zinc tin oxide ZnSnO, 20nm, seed layer zinc oxide ZnO, 5nm, functional layer silver Ag, 11.2nm, metal nickel-chromium alloy protective layer NiCr, 1.5nm, dielectric protective layer Si 3 N 4 , 36nm.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com