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Composition for forming coating film and method for forming coating film using same

一种组合物、覆膜的技术，应用在涂层等方向，能够解决气体阻隔性能不充分等问题，达到优异气体阻隔性能的效果

Inactive Publication Date: 2018-01-02
AZ ELECTRONICS MATERIALS LUXEMBOURG R L
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, according to the studies of the inventors of the present invention, it has been found that the gas barrier performance of the coating film formed by the coating film forming material mainly composed of polysilazane is often insufficient. Film-forming composition and film-forming method of further improved film

Method used

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  • Composition for forming coating film and method for forming coating film using same
  • Composition for forming coating film and method for forming coating film using same
  • Composition for forming coating film and method for forming coating film using same

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Embodiment Construction

[0028] Embodiments of the present invention will be described in detail below.

[0029] Composition for film formation

[0030] The film-forming composition of the present invention contains a silicon compound, a polysilazane, and an organic solvent as essential components, and may contain other additives as necessary. These respective components are described as follows.

[0031] silicon compound

[0032] In the present invention, a silicon compound having a specific structure is used as the silicon compound. When the composition layer formed from the film-forming composition of the present invention is exposed to light, the silicon compound reacts with polysilazane described later to form a cured film. This silicon compound is a compound represented by the following general formula (1).

[0033]

[0034] In the formula, R 1 Each is independently selected from hydrogen, halogen atom, hydrocarbon group, hydroxyl group, hydrocarbon hydroxyl group, acyl group, acyloxy...

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Abstract

The present invention provides a composition for forming a coating layer having excellent gas barrier performance and a method of forming the coating layer. A composition for forming a coating film comprises a specific silicon compound which reacts with a polysilazane by exposure, a polysilazane and an organic solvent, and a method for forming a coating layer comprises coating the composition on asubstrate and exposing.

Description

technical field [0001] The present invention relates to a composition for producing a coating film having high gas barrier performance, and a coating film forming method using the composition, the coating film being applicable to the production of display devices and semiconductor components. Background technique [0002] Silicone films have relatively high hardness and compactness, so they are used in various applications in the field of semiconductor manufacturing. Specifically, they are used in hard coating films such as substrates and circuits, gas barrier films, and substrate strength-enhancing films. middle. As such a siliceous membrane, various siliceous membranes are being studied. [0003] Among them, a method of forming a film having particularly excellent gas barrier properties is being studied. Among these methods, polysilazane is generally used as a film forming material. For example, Patent Document 1 discloses a method of laminating a plurality of gas barri...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L83/16C08K5/5425C09D183/16C08G77/62C08K5/544C08K5/5419C08L83/00
CPCC09D183/16C08L83/16C08G77/62C08L83/00C08K5/544C08K5/5419C08K5/5425C08K5/5445C09D183/14C08J3/28C08J2383/16C08L2201/14C08L2203/16C08J5/18
Inventor 河户俊二尾崎祐树佐竹昇小林政一远藤弘宪
Owner AZ ELECTRONICS MATERIALS LUXEMBOURG R L
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