Cleaning device for polycrystalline silicon production equipment

Abstract

The invention relates to the technical field of polycrystalline silicon production equipment, and discloses a cleaning device for polycrystalline silicon production equipment. The cleaning device for the polycrystalline silicon production equipment comprises a cleaning tank, wherein the outer side of the bottom end of the cleaning tank is fixedly connected with a ring; a placement plate penetrates through the middle of the ring; the upper surface of the placement plate is fixedly connected with an ultrasonic device; the bottom of the placement plate is fixedly connected with a fixing rod; the bottom end of the fixing rod is fixedly connected with a base; two ends of the base are fixedly connected with longitudinal supporting racks separately; the top ends of the longitudinal supporting racks are fixedly connected with a fixing rack; and the middle of the fixing rack is fixedly connected with a stirring motor. The cleaning device for the polycrystalline silicon production equipment is provided with the ultrasonic device; by an ultrasonic vibrator, a cleaning solvent in the cleaning tank shakes violently, therefore, the force of contact between the solvent and production equipment is increased, lots of dead corners of the production equipment are cleaned well, and the circumstance that the production equipment is corroded if an acid solvent is used for cleaning the production equipment is avoided.

Description

technical field [0001] The invention relates to the technical field of polysilicon production equipment, in particular to a cleaning device for polysilicon production equipment. Background technique [0002] Polycrystalline silicon is a form of elemental silicon. When molten elemental silicon solidifies under supercooled conditions, silicon atoms are arranged in the form of diamond lattices to form many crystal nuclei. If these nuclei grow into crystal grains with different crystal plane orientations, then These grains combine to crystallize into polysilicon. In the polysilicon production process, oil molecules, dust and other dirt are very harmful to polysilicon. It has been proved that the oil content of a few ppm in the entire process system may slow down the reaction speed of polysilicon, reduce the output, and even stop the silicon reaction. Therefore, In the process of equipment cleaning, it is very necessary to clean the dirt. Contents of the invention [0003] (1...

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Problems solved by technology

[0004] Aiming at the deficiencies of the prior art, the present invention provides a cleaning device for polysilicon production equipment, which has the advantage of good cleaning effect and solves the problem of poor cleaning effect of the existing equipment

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