A tail gas treating device and method

A technology for tail gas treatment and filtration device, which is applied in separation methods, chemical instruments and methods, and dispersed particle separation, etc., can solve the problem that the toxic sediment particles in the tail gas cannot be rapidly cooled, precipitated and collected, and achieves space saving, efficient cleaning and cleaning. Collect and reduce the effect of device interfaces

Pending Publication Date: 2017-10-24
紫石能源有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide a tail gas treatment device and method for solving the problem that the toxic deposition particles in the tail gas of MOCVD equipment and other deposition equipment cannot be rapidly cooled and precipitated and deposited and collected

Method used

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  • A tail gas treating device and method
  • A tail gas treating device and method
  • A tail gas treating device and method

Examples

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Embodiment 1

[0027] This embodiment relates to an exhaust gas treatment device, such as Figure 2-3 As shown, the exhaust gas treatment device includes an intake chamber 15, a cooling deposition chamber 34, and an exhaust chamber 29 from bottom to top. The intake chamber 15 is located below the cooling deposition chamber 34, and the cooling deposition chamber 34 is provided with a cooling cylinder 20 inside. A deposition chamber 14 is formed between the outer wall 33 of the cooling cylinder and the inner wall of the cooling deposition chamber 34. The deposition chamber 14 is provided with one or more particle cleaning mechanisms for cleaning the outer wall 33 of the cooling cylinder and the inner wall of the cooling deposition chamber 34.

[0028] Preferably, the particle cleaning mechanism in this embodiment is a roller brush 19, the upper end of the roller brush 19 is connected to the upper planet carrier 21, and the stepping motor 25 controls the upper planet carrier through the belt convey...

Embodiment 2

[0035] This embodiment relates to an exhaust gas treatment device. The exhaust gas treatment device of this embodiment is based on the device of the foregoing embodiment 1. A collection part 35 is provided below the cooling deposition chamber 34, and the collection part 35 is in communication with the bottom of the cooling deposition chamber 34 , That is, the collecting part 35 is located below the deposition chamber 14 to realize online collection of deposited particles.

[0036] Preferably, in this embodiment, the collection part 35 includes a collection chamber 13 and a collection bucket 10 from top to bottom, and is provided with a collection chamber valve 12 and a collection bucket valve 11, and the collection chamber 13 is in the shape of a funnel, and the deposited particles fall into The inclined surface of the funnel-shaped collection chamber 13 will enter the collection bucket 10 without causing accumulation. The simultaneous existence of the collection chamber valve 12 ...

Embodiment 3

[0039] This embodiment relates to an exhaust gas processing method, which uses a cooling deposition chamber to cool and deposit the exhaust gas, and at the same time clean the deposited particles; and use a collecting part connected to the lower part of the cooling deposition chamber to collect and clean the deposited particles.

[0040] Preferably, while cleaning the deposited particles, a filter device connected to the upper part of the cooling deposition chamber is also used to filter the cooled and deposited exhaust gas.

[0041] Specifically, after the tail gas of the MOCVD equipment enters the cooling deposition chamber, under the cooling effect of the cooling deposition chamber, the deposited particles of the tail gas are precipitated and cleaned to the collecting part communicating with the lower part of the cooling deposition chamber. At the same time, the exhaust gas after the cooling deposition enters and The filter device connected above the cooling deposition chamber is...

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Abstract

A tail gas treating device and method are disclosed and used for treating tail gas of metalorganic chemical vapor phase deposition (MOCVD) equipment. The device includes a gas feeding cavity, a cooling and deposition chamber and a gas discharging cavity in order from bottom to top. The gas feeding cavity is at the lower side part of the cooling and deposition chamber. A cooling drum is disposed in the cooling and deposition chamber. A deposition cavity is formed between the external wall of the cooling drum and the inner wall of the cooling and deposition chamber. The inside of the deposition cavity is provided with one or a plurality of particle cleaning mechanisms. The gas discharging cavity is provided with at least one stage of a filter. A collecting part is communicated with the lower part of the cooling and deposition chamber. The method includes cleaning and collecting deposition particles at the same time of cooling and depositing the tail gas by utilizing the cooling and deposition chamber, and filtering the tail gas. The device and the method can achieve rapid cooling and precipitation of deposited particles, cooling, deposition, cleaning, collection and filtration are integrated in the one device and performed simultaneously, and a low occupied space, convenient cleaning, and collection of deposited particles in the tail gas of the MOCVD equipment without the need of shutdown are achieved.

Description

Technical field [0001] The invention relates to the technical field of tail gas treatment, in particular to a tail gas treatment device and method. Background technique [0002] Today, with the rapid development of LED, semiconductor manufacturing, and solar cells, the metal organic chemical vapor deposition (MOCVD) process, as a technology for producing high-quality semiconductor thin film materials, has become more widely used. However, most of the MOCVD process involves the use of toxic materials, flammable and explosive materials and corrosive materials, and the exhaust gas emitted by MOCVD equipment contains flammable, explosive and toxic by-products, which will seriously pollute the environment. [0003] At present, the common exhaust gas treatment technology is to carry out multi-stage filtration of the exhaust gas, such as figure 1 The general-purpose filter shown is a common filter in the domestic market. After the exhaust gas of the MOCVD equipment is discharged from the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/00B01D46/10
CPCB01D46/10B01D53/002
Inventor 赵青松管长乐
Owner 紫石能源有限公司
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