Pixel defining layer and manufacturing method thereof
A technique for defining a pixel definition layer and a manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., and can solve the problems of complicated plasma processing steps, high purity requirements, and inability to obtain liquid repellency, etc. Achieve the effect of material saving, high material utilization rate and low manufacturing cost
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[0051] see Figure 7 , the present invention provides a first embodiment of a method for manufacturing a pixel defining layer, which includes:
[0052] Prepare the first defined layer on the substrate 101, wherein the first defined layer includes a dam body 102 partially covered on the substrate 101, generally, the material of the dam body 102 is a common defined layer material, which does not require liquid-repellent properties, and more Further, a black light-shielding material can be arranged under the dam body 102, or the dam body 102 is made of black light-shielding material to prevent lateral light leakage;
[0053] Prepare a layer of lyophobic film 103 on the substrate 101 and the first defining layer;
[0054] A photoresist layer 113 is prepared on the top of the dam 102 located in the first defining layer. Specifically, a layer of photoresisting layer 113 can be prepared on the entire substrate 101 and the first defining layer, and then through the yellow light proce...
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