Method for improving coating film quality of linear magnetron sputtering target gun on concave column face substrate

A technology of magnetron sputtering and cylindrical surface, which is applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc. Quality reduction and other issues, to reduce adverse effects, improve film quality, and improve reflection efficiency

Active Publication Date: 2017-07-28
TONGJI UNIV
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  • Application Information

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Problems solved by technology

This irregular structure leads to problems such as more voids in the film and different grain sizes. Under the influence of these factors, the quality of film formation is greatly reduced, and it cannot meet the requirements of nested grazing incidence focusing X-ray astronomical telescope lenses for film formation. Film Quality Requirements

Method used

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  • Method for improving coating film quality of linear magnetron sputtering target gun on concave column face substrate
  • Method for improving coating film quality of linear magnetron sputtering target gun on concave column face substrate
  • Method for improving coating film quality of linear magnetron sputtering target gun on concave column face substrate

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Embodiment １

[0022] The equipment for process improvement has the following characteristics: the target gun is a linear magnetron sputtering target gun, and the size of the sputtering surface of the target gun is 38mm×508mm. In view of the special shape of the target gun and the large incident angle of the sputtered particles on the substrate due to its special shape, the combination of the mask plate and the partition plate is used to limit the incident angle of the sputtered particles on the substrate. Improve film quality.

[0023] When preparing a cylindrical concave mirror, the plated sample is cylindrical D263 glass with a diameter of 170 mm, an arc angle of 60°, an axial length of 210 mm, and a thickness of 0.27 mm. The sample busbar is placed along the horizontal direction, and the central busbar is parallel to the sample holder of the target surface and located in the center of the sample holder. Two partitions parallel to the horizontal direction and perpendicular to the sample ...

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Abstract

The invention relates to a method for improving the coating film quality of a linear magnetron sputtering target gun on a concave column face substrate. A mask mounted in front of the target gun and partition boards mounted at the positions, located on the two symmetric positions of a sample, of a sample frame are used for limiting the distribution angle of sputtered particles, in the horizontal and vertical direction, of the large-size linear magnetron sputtering target gun, the incident angle, inclined bombardment of the substrate, of the sputtered particles is reduced, the side effect of the sputtered particles which bomb the substrate in an inclined manner on the film forming quality is reduced, and the thin film quality of the concave column face substrate is improved.

Description

technical field [0001] The invention relates to a method for improving the coating quality of a linear magnetron sputtering target gun on a concave cylindrical substrate, and belongs to the field of optical thin films. Background technique [0002] With the increasing demand for astronomical exploration in our country, the development of nested grazing incidence focusing X-ray astronomical telescope has been put on the agenda. The lens of the nested grazing incidence focusing X-ray astronomical telescope has the characteristics of large size and cylindrical symmetry. However, most of the existing coating machines adopt the planetary motion mode of rotation and revolution. Such a motion mode makes the lens produced by it have circular symmetry. characteristics, cannot meet our current requirements for the preparation of large-size cylindrical mirror lenses of nested grazing incidence focusing X-ray astronomical telescopes with cylindrical symmetry. The design of a large-scal...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/54
CPCC23C14/044C23C14/35C23C14/54
Inventor 王占山黄秋实齐润泽张众
Owner TONGJI UNIV
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