Evaporation crucible heat field control device and evaporation system

Abstract

The invention relates to a thermal field control device for an evaporation crucible, which includes: an evaporation crucible and a heating device; several temperature detection units for detecting the temperature of several detection points on the evaporation crucible; several reflection plates arranged on the evaporation crucible the periphery of the evaporation crucible, and is used to reflect heat to the evaporation crucible; and a control unit, based on the temperatures detected by the temperature detection units, controls the movement of the plurality of reflectors to adjust the relationship between each reflector and the The distance between the above-mentioned evaporation crucibles. In the thermal field control device of the evaporation crucible, the control unit independently controls each reflection plate according to the actual temperature of each detection point, so that the reflection plate near the area with high temperature of the evaporation crucible is far away from the evaporation crucible, and the reflection plate near the area with low temperature is far away from the evaporation crucible. The plate is close to the evaporation crucible, so that the entire thermal field is more uniform, so that the evaporation source is heated uniformly, and the final film thickness is uniform. The invention also provides an evaporation system.

Description

technical field [0001] The invention relates to the display field, in particular to an evaporation crucible thermal field control device and an evaporation system in the display panel manufacturing process. Background technique [0002] In the manufacturing process of display panels, especially in the manufacturing process of OLED display panels, an evaporation process is usually used to form a film layer. During the evaporation operation, the evaporation source is generally placed in the evaporation crucible, and then the evaporation crucible is heated, so that the evaporation source is heated and vaporized to leave the evaporation crucible, and finally the evaporation source is coated on the surface to be evaporated. on the substrate, thereby forming a film layer on the substrate to be evaporated. [0003] However, the current film layer formed by vapor deposition is generally thicker in some areas and thinner in some areas, that is, the thickness of the formed film layer...

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Problems solved by technology

[0004] Based on this, it is necessary to address the problem of uneven thickness of the film layer formed by evaporation in the prior art, and provide an evaporation crucible thermal field control device capable of forming a film layer with uniform thickness

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