Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Wave-front sensor, wave-front detection method and wave-front detection system based on microholographic array

A wavefront sensor and wavefront detection technology, applied in the field of adaptive optics, can solve the problems of increasing error and affecting the accuracy of wavefront reconstruction, etc., and achieve the effect of high detection accuracy

Active Publication Date: 2017-02-22
SHENZHEN UNIV
View PDF2 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the sample is axially displaced, the image point will not be on the back focal plane after the incident wavefront passes through the microlens, resulting in a certain defocus, and the spot on the detection surface will become larger with the increase of the defocus distance [ figure 2 (b)], in this way, the error in calculating the centroid offset will increase accordingly, which will directly affect the accuracy of wavefront reconstruction

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wave-front sensor, wave-front detection method and wave-front detection system based on microholographic array
  • Wave-front sensor, wave-front detection method and wave-front detection system based on microholographic array
  • Wave-front sensor, wave-front detection method and wave-front detection system based on microholographic array

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0101] The number of microlenses adopted is 5*5, the diameter of the microlens is 600 μm, and the focal length is 5mm. A spherical wave is generated by simulation, and the wavefront recovery is carried out by the wavefront detection method of the micro-holographic array of the present invention, such as Figure 9 as shown, Figure 9 (a) in (a) is the spherical wavefront to be analyzed; Figure 9 (b) in is the spherical wavefront phase distribution to be analyzed; Figure 9 (c) in is the recovered spherical wavefront; Figure 9 (d) in is the phase of the recovered spherical wave; Figure 9 (e) in is the wavefront difference between the spherical wave to be measured and the recovered spherical wave; Figure 9 (f) is the phase difference between the spherical wave to be measured and the recovered spherical wave, as can be seen from the figure, the spherical wavefront recovered by the wavefront detection method provided by the present invention is very close to the spherical wa...

Embodiment 2

[0103] The number of micro-lenses adopted is 5*5, the micro-lens diameter is 600 μ m, and the focal length is 5 mm, an arbitrary wave front (non-ideal plane wave) is simulated, and the wave front is recovered with the wave front detection method of the micro-holographic array of the present invention ,Such as Figure 10 as shown, Figure 10 (a) in is the wavefront to be analyzed; Figure 10 (b) in is the wavefront phase distribution to be analyzed; Figure 10 (c) in is the recovered wavefront; Figure 10 (d) in is the recovered phase; Figure 10 (e) is the wavefront difference between the wavefront to be measured and the restored wavefront; Figure 10 (f) in is the phase difference between the wavefront to be measured and the wavefront to be recovered, and at the same time, under the same simulation conditions, the wavefront to be measured is recovered by the traditional Shaker-Hartmann wavefront detection method, The root mean square error (RMSE) between the wavefront re...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a wave-front sensor, a wave-front detection method and a wave-front detection system based on a microholographic array. The wave-front detection method based on the microholographic array comprises the following steps: creating the microholographic array which simultaneously has a microlens imaging function and a double helix point diffusion-function function; enabling a to-be-detected wave-front to pass through the microholographic array and obtaining a double helix lattice diagram on a rear focal plane of the microholographic array; obtaining a wave-front slope value according to the double helix lattice diagram, and performing wave-front reconstruction on the wave-front slope value to obtain to-be-detected wave-front information. After the to-be-detected wave-front passes through the microholographic array, the double helix lattice diagram is obtained on the rear focal plane of the microholographic array; when pixel points of the rear focal plane of the microholographic array are out of focus, double helix points can rotate according to a certain rule but cannot significantly expand like gauss points, so that the influence of wave-front out-of-focus errors on reconstruction precision can be inhibited; when a sample generates axial displacement, high detection precision can be stilled obtained, and the detection range in the axial direction of the sensor is improved on the premise of ensuring the detection precision.

Description

technical field [0001] The invention relates to the technical field of adaptive optics, in particular to a wavefront sensor based on a micro-holographic array, a wavefront detection method and a system. Background technique [0002] Wavefront detection and measurement play an important role in the fields of optical components and semiconductor manufacturing as well as astronomy and aviation. Among them, the new detection technology represented by the Shack-Hartmann wavefront sensor is widely used in optical components, metal surfaces, etc. Detection and measurement of beam wavefront distortion and phase difference; the current measurement technology is mainly divided into two categories, one is the direct measurement of the wavefront shape, and the other is the measurement of the wavefront slope; their representatives are interferometer and Shaker-Hartmann wavefront sensor. Since the interferometer needs to undergo strict and precise calibration, the supporting facilities a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/021
CPCG01B9/021
Inventor 于斌李四维曹博屈军乐
Owner SHENZHEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products