Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Polypeptide silk moisturizing repairing facial mask and preparation method thereof

A silk and moisturizing technology, applied in the field of polypeptide silk moisturizing and repairing mask, can solve problems such as dark spots, and achieve the effect of diluting pores, delaying skin aging, and removing free radicals

Inactive Publication Date: 2016-11-16
安迪美生物科技(北京)有限公司
View PDF6 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] There are many types of facial masks on the market, such as acne-removing facial masks, whitening facial masks, and moisturizing facial masks. Frequent use of facial masks can keep people's skin moist and shiny, but with the deterioration of the environment and the growth of age, people's skin will appear dull. Spots, stains, wrinkles and other skin problems, simple hydration and whitening can no longer meet people's needs. Masks with skin repair functions have become a new demand for people

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] A polypeptide silk moisturizing and repairing facial mask, comprising the following raw materials in parts by weight: glycerin 3.9kg, propylene glycol 3.9kg, butanediol 3.9kg, fructose 0.29kg, oligopeptide-50.5kg, oligopeptide-30.29kg, oligopeptide-10.29 kg, sodium hyaluronate 0.04kg, methylparaben 0.09kg, North American witch hazel extract 1.4kg, palmitoyl tripeptide-11.4kg, palmitoyl tetrapeptide-71.4kg, sophora flavescens extract 1.4kg, baicalensis root Extract 0.29kg, Eucommia bark extract 0.04kg, Burdock seed extract 0.04kg, Astragalus membranaceus root extract 0.04kg, Magnolia officinalis bark extract 0.09kg, Green tea extract 0.09kg, Elm elm root extract 0.19kg , Schisandra chinensis extract 0.04kg, wolfberry extract 0.04kg, cucumber extract 0.04kg, hydrogenated castor oil 0.09kg, phenoxyethanol 0.09kg, elastin 0.09kg.

[0046] The preparation method of the above-mentioned polypeptide silk moisturizing and repairing mask comprises the following steps:

[0047] (...

Embodiment 2

[0052] A polypeptide silk moisturizing and repairing mask, comprising the following raw materials in parts by weight, glycerin 4kg, propylene glycol 4kg, butanediol 4kg, fructose 0.3kg, oligopeptide-50.51kg, oligopeptide-30.3kg, oligopeptide-10.3kg, Sodium Hyaluronate 0.05kg, Methylparaben 0.1kg, Witch Hazel Extract 1.2kg, Palmitoyl Tripeptide-11.5kg, Palmitoyl Tetrapeptide-71.5kg, Sophora Sophorae Extract 1.5kg, Scutellaria Baicalensis Root Extract 0.3kg, Eucommia bark extract 0.05kg, Burdock seed extract 0.05kg, Astragalus membranaceus root extract 0.05kg, Magnolia officinalis bark extract 0.1kg, green tea extract 0.1kg, Elm elm root extract 0.2kg, Schisandra extract 0.05kg, wolfberry extract 0.05kg, cucumber extract 0.05kg, hydrogenated castor oil 0.1kg, phenoxyethanol 0.1kg, elastin 0.1kg.

[0053] The preparation method of the above-mentioned polypeptide silk moisturizing and repairing mask comprises the following steps:

[0054] (1) Mix glycerin, propylene glycol, butan...

Embodiment 3

[0059] A polypeptide silk moisturizing and repairing facial mask, comprising the following raw materials in parts by weight: glycerin 4.1kg, propylene glycol 4.1kg, butanediol 4.1kg, fructose 0.31kg, oligopeptide-50.52kg, oligopeptide-30.31kg, oligopeptide-10.31 kg, sodium hyaluronate 0.06kg, methylparaben 0.11kg, North American witch hazel extract 1.6kg, palmitoyl tripeptide-11.6kg, palmitoyl tetrapeptide-71.6kg, sophora flavescens extract 1.6kg, baicalensis root Extract 0.31kg, Eucommia Bark Extract 0.06kg, Burdock Seed Extract 0.06kg, Astragalus membranaceus Root Extract 0.06kg, Magnolia officinalis Bark Extract 0.11kg, Green Tea Extract 0.11kg, Spring Elm Root Extract 0.21kg , Schisandra chinensis extract 0.06kg, wolfberry extract 0.06kg, cucumber extract 0.06kg, hydrogenated castor oil 0.11kg, phenoxyethanol 0.11kg, elastin 0.11kg.

[0060] The preparation method of the above-mentioned polypeptide silk moisturizing and repairing mask comprises the following steps:

[006...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a polypeptide silk moisturizing repairing facial mask. The facial mask is prepared from the following raw materials: glycerinum, propylene glycol, butylene glycol, fructose, oligopeptides-5, oligopeptides-3, oligopeptides-1, sodium hyaluronate, methylparaben, hamamelis virginiana extract, palmitoyl tripeptide-1, palmitoyl tetrapeptide-7, radix flavescentis extract, scutellaria root extract, eucommia ulmoides bark extract, great burdock fruit extract, astragalus membranaceus root extract, magnolia officinalis bark extract, green tea extract, ulmus davidiana root extract, kadsura longepedunculata extract, Chinese wolfberry fruits, cucumber extract, hydrogenated castor oil, phenoxyethanol and elastin. The facial mask has the beneficial effects of moisturizing, sterilizing, softening cutin, clearing free radicals, promoting formation of collagen and delaying senescence, can be used for repairing dry skin, lightening pores, repairing black spots caused by aging, sunlight exposure and sleep insufficiency and removing wrinkles on the face, so that skin can be tender and bright.

Description

technical field [0001] The invention relates to the field of cosmetics, in particular to a polypeptide silk moisturizing and repairing facial mask. Background technique [0002] With the development of the economy, the pace of work and life is getting faster and faster, coupled with the damage of bad living habits and other factors to the skin, more and more people are suffering from dryness, roughness, inelasticity, dull complexion, allergies, etc. Troubled by skin problems, facial masks have become one of the most popular skin care products. [0003] Mask is a carrier of beauty care products. It uses the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, and increase the oxygen content of the skin. , helps the skin to eliminate the products of epidermal cell metabolism and accumulated oily substances, the water in the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/97A61K8/92A61K8/37A61K8/60A61K8/64A61K8/73A61K8/34A61Q19/02A61Q19/08A61P17/00
CPCA61K8/345A61K8/34A61K8/37A61K8/60A61K8/64A61K8/735A61K8/922A61K8/97A61K36/185A61K36/28A61K36/42A61K36/46A61K36/481A61K36/489A61K36/539A61K36/57A61K36/575A61K36/79A61K36/815A61K36/82A61Q19/02A61Q19/08A61K2300/00
Inventor 杨子中朱丽刚黄书允章方强祁艳辉范红军沈立波高云霞
Owner 安迪美生物科技(北京)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com