Composition for treating wound pruritus and promoting wound healing
A technology for wound healing and composition, applied in the directions of drug combination, biochemical equipment and methods, medical preparations containing active ingredients, etc.
Inactive Publication Date: 2016-11-02
SICHUAN YINGNAIDE MEDICAL TECH CO LTD
View PDF8 Cites 9 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Under conditions of specific etiology, these treatments are effective, and other treatment modalities have not been found to have a clear benefit
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreExamples
Experimental program
Comparison scheme
Effect test
Embodiment approach 1
[0038] In Table 1 are embodiments of water-soluble compositions.
[0039] Table 1
[0040] combination
Embodiment approach 2
[0042] In Table 2 are embodiments of water-soluble compositions containing lipase.
[0043] Table 2
[0044] combination
Embodiment approach 3
[0046] In Table 3 are embodiments of water-soluble compositions containing germicidal ingredients.
[0047] table 3
[0048] combination
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More
Abstract
The invention discloses a composition for treating wound pruritus and promoting wound healing, particularly, a medical dressing, and relates to the technical field of biomedicines. The composition is based on amylase, and includes [alpha]-, [beta]-, and [gamma]-amylase, wherein the amylase acts on an [alpha]-glycosidic bond of polysaccharide so as to split the polysaccharide to generate carbohydrate / saccharide fragments which are low in molecular weight. According to the mechanism, it is further found that the amylase can effectively alleviate and eliminate skin pruritus and further promotes wound healing.
Description
technical field [0001] The invention discloses a composition for treating wound pruritus and promoting wound healing. Specifically, it is a medical dressing, which belongs to the technical field of biomedicine. Background technique [0002] Itching is a local or systemic symptom that often results in scratching and irritation of nerve endings. Severe scratching may cause skin irritation, bleeding and infection. Although itching usually occurs in cutaneous areas, it can also occur in non-skin areas, such as the mucous membranes or the cornea. Itchy skin can be caused by a variety of causes, including extrinsic and exogenous factors, localized skin disorders, and systemic disorders. Wound healing after trauma or surgery is often accompanied by local itching. Itching can also be a component of inflammation. [0003] Although histamine is one of the most common itching substances, other chemicals can also cause itching, such as interleukins, prostaglandins, etc. Therefore,...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K38/54A61P17/02A61L15/38A61L15/44A61K38/48A61K38/47
CPCA61K38/54A61L15/38A61L15/44A61L2300/402A61L2300/412C12Y302/01001
Inventor 宋代馨李航
Owner SICHUAN YINGNAIDE MEDICAL TECH CO LTD
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com