Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for acquiring optimal focal plane distance of laser direct imaging equipment

A technology of laser direct imaging and best focal plane, which is applied in the direction of microlithography exposure equipment, optics, photoplate making process of pattern surface, etc. It can solve the problems of inaccuracy, incomplete exposure of dry film, and affecting image quality of graphics, etc. , to achieve the effect of improving detection efficiency and accuracy and reducing the risk of scrapping

Inactive Publication Date: 2016-05-04
HEFEI ADVANTOOLS SEMICON
View PDF7 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the laser is focused on the dry film through an optical lens, when the focal plane is just on the surface of the dry film, the intensity of light received by the dry film is the strongest and the image is the clearest, so it is necessary to determine the position of the focal plane before exposure Whether it is on the surface of the dry film, if the focal plane is shifted (that is, commonly known as defocus), it will cause insufficient light intensity received by the exposure pattern on the dry film, and insufficient light intensity will lead to insufficient exposure of the dry film. Completely, after chemical development, it will be dissolved by the chemical solution or fall off due to the reduction of adhesion, which will seriously affect the image quality of the image.
[0004] At present, the commonly used focal plane detection method is to expose and develop the PCB covered with dry film, and then use a microscope to measure whether the actual circuit is consistent with the design value. If not, continue to adjust the distance from the optical path to the board surface, and repeat the exposure and development measurement. Until the optimal exposure focal plane is found, this detection method is cumbersome and time-consuming, and it is not accurate enough due to the measurement error of the microscope

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for acquiring optimal focal plane distance of laser direct imaging equipment
  • Method for acquiring optimal focal plane distance of laser direct imaging equipment
  • Method for acquiring optimal focal plane distance of laser direct imaging equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] The method for obtaining the optimal focal plane distance of the laser direct imaging device is specifically carried out as follows:

[0035] Step 1: The operator inputs a focal plane detection pattern to the laser direct imaging device; the focal plane detection pattern contains 10 exposure patterns;

[0036] Step 2: In a yellow light environment, place a substrate on the exposure workbench of the laser direct imaging equipment. The substrate is a PCB board covered with a layer of photosensitive dry film; the photosensitive dry film is SL1329 produced by Hitachi The dry film; Subsequently, adjust the relative distance between the laser head of the laser direct imaging device and the exposure workbench to be 5.00mm;

[0037]Step 3: In the environment of yellow light, let the laser generated by the laser head of the laser direct imaging device directly project the shape of the focal plane detection pattern entered in step 1 on the substrate, that is, complete the first e...

Embodiment 2

[0050] The method for obtaining the optimal focal plane distance of the laser direct imaging device, specifically operates as follows:

[0051] Step 1: making a focal plane detection graphics board; the focal plane detection graphics board contains 10 exposure graphics;

[0052] Step 2: In a yellow light environment, place a substrate on the exposure workbench of the laser direct imaging equipment, and the substrate is a PCB board covered with a layer of photosensitive dry film; the photosensitive dry film is YQ40PN produced by Asahi Kasei The dry film; Subsequently, adjust the relative distance between the laser head of the laser direct imaging device and the exposure workbench to be 2.00mm;

[0053] Step 3: In the environment of yellow light, let the laser generated by the laser head of the laser direct imaging device directly project the shape of the focal plane detection pattern entered in step 1 on the substrate, that is, complete the first exposure of the substrate , at...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Login to View More

Abstract

In the prior art, the exposure focal plane of laser direct imaging equipment is difficult to rapidly acquire. Based on the difficult problem in the prior art, the present invention provides a method for acquiring the optimal focal plane distance of laser direct imaging equipment. The method comprises: inputting a focal plane detection pattern into laser direct imaging equipment; installing and debugging a substrate; carrying out primary exposure on the substrate; carrying out primary displacement exposure on the substrate; repeatedly performing the displacement exposure on the substrate; developing the substrate; and finding the least shedding pattern on the substrate. According to the present invention, the necessarily-used detection step for measuring the line width by using a microscope in the traditional method is eliminated, the optimal expose focal plane can be quickly, intuitively and accurately found, the detection efficieny and the accuracy of the focal plane are improved, and the PCB reject risk caused by the insufficient exposure is reduced.

Description

technical field [0001] The invention relates to the technical field of printed circuit board pattern transfer, in particular to a method for obtaining the optimal focal plane distance of a laser direct imaging device. Background technique [0002] For the field of printed circuit board processing, especially the manufacture of high-precision HDI boards and packaging substrates, image transfer equipment is undoubtedly the core part. [0003] At present, there are two types of printed circuit board (PCB) image transfer equipment: traditional projection exposure equipment and laser direct imaging equipment (LDI). The graphics of the traditional projection exposure equipment have been printed on the film film, and the film film is irradiated with ultraviolet rays to transfer the figure to the PCB with a photosensitive dry film on the surface. After the dry film is exposed, the unexposed part of the dry film is dissolved by a chemical solution. In the laser direct imaging equipm...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F9/00G03F7/20
Inventor 严孝年吴飞王本祥何少峰方林朱光伟陈和明
Owner HEFEI ADVANTOOLS SEMICON
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products