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Substrate tray and substrate processing apparatus including same

A substrate processing and substrate technology, applied in the field of substrate processing equipment, can solve problems such as process unevenness, substrate dislocation, and substrate pickup failure, and achieve the effects of increasing yield, preventing sinking, and preventing process defects

Active Publication Date: 2015-09-23
JUSUNG ENG
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Accordingly, substrate (S) misalignment may occur inside the substrate processing equipment, resulting in defects such as substrate pick-up failure and process non-uniformity

Method used

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  • Substrate tray and substrate processing apparatus including same
  • Substrate tray and substrate processing apparatus including same
  • Substrate tray and substrate processing apparatus including same

Examples

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Embodiment Construction

[0030] Description will be made in detail with reference to exemplary embodiments of the invention, which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used throughout the drawings to refer to the same or like parts.

[0031] The substrate tray 1 according to the present invention functions to support a plurality of substrates (S) to be processed and load them into the substrate processing apparatus. Here, substrate processing, such as a deposition process, an etching process, a cleaning process, etc., may be performed on the substrate (S).

[0032] refer to figure 2 , the substrate tray 1 according to the present invention may include: a plurality of belts 3 for supporting a plurality of substrates (S) arranged in the first axis direction (X coordinate axis direction); A plurality of tapes 3 in the second axis direction (Y coordinate axis direction, perpendicular to the first axis direction) are combined. With respect to t...

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Abstract

The present invention relates to a substrate tray and a substrate processing apparatus including same. The substrate tray includes: a plurality of straps for supporting a plurality of substrates arranged in a first axial direction; and a supporting frame to which a plurality of the straps is coupled in a second axial direction perpendicular to the first axial direction, wherein the straps are each formed in a length greater than the substrates in the second axial direction. According to the present invention, a plurality of straps are used to support a plurality of substrates, so that a substrate tray can easily be made large in size by increasing the number of straps.

Description

technical field [0001] The present invention relates to a substrate tray for loading substrates and a substrate processing apparatus including the substrate tray. Background technique [0002] The substrate processing equipment is used to perform a texturing process of etching a substrate, a process of forming a semiconductor layer, and a process of forming electrodes. Such a substrate processing apparatus performs the above-described processes by using a substrate tray capable of loading a plurality of substrates. For example, a substrate processing apparatus for performing a thin film deposition process (eg, a plasma deposition process) may simultaneously deposit a thin film material on a plurality of substrates loaded on a substrate tray at regular intervals. [0003] figure 1 A prior art substrate tray is schematically shown. [0004] refer to figure 1 , the substrate tray 10 in the prior art may include a support frame 11 and a support plate 12 . The support frame ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/673B65D85/38B65D85/86
CPCH01L21/67333H01J37/32715C23C16/4581C23C16/4585C23C16/4586H01L21/68771H01L21/673H01L21/67309H01L21/67383C23C16/458C23C16/50H01J37/32009H01L21/68785
Inventor 赵晟佑金钟寅朴慈日李基哲崔钟龙
Owner JUSUNG ENG
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