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Preparation method of WO3/C3N4 mixed photocatalyst

A C3N4, catalyst technology, applied in the field of nanotechnology, can solve the problems of low catalytic efficiency of composite materials, and achieve the effects of short catalytic time, improved photocatalytic activity, and improved catalytic degradation rate.

Inactive Publication Date: 2015-07-15
SHANGHAI INST OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] One of the purposes of the present invention is to prepare WO in order to solve the prior art grinding method 3 / C 3 N 4 In the process of composite photocatalyst, due to simple mechanical grinding, WO 3 with C 3 N 4 Dispersion is complete, and finally the resulting WO 3 / C 3 N 4 To solve technical problems such as low catalytic efficiency of composite materials and provide a WO 3 / C 3 N 4 The preparation method of the composite photocatalyst, due to the use of ultrasonic treatment after mechanical mixing, makes WO 3 and C 3 N 4 A better hybrid system can be achieved. This hybrid system can significantly enhance the separation effect of the photogenerated electron-hole pairs of the material, so a WO with high photocatalytic activity can be obtained. 3 / C 3 N 4 composite photocatalyst

Method used

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  • Preparation method of WO3/C3N4 mixed photocatalyst

Examples

Experimental program
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Effect test

Embodiment 1

[0027] a WO 3 / C 3 N 4 The preparation method of composite photocatalyst specifically comprises the following steps:

[0028] (1) Preparation of WO by hydrothermal method 3 Nano powder

[0029] Calculated by mass ratio, Na 2 WO 4 : NaCl: deionized water in a ratio of 1:1.4:38, put 1.65g of Na 2 WO 4 , 2.32g of NaCl was added to 38.0g of deionized water, stirred to make it all dissolved, to obtain a mixed solution, then adjusted pH to 2.0 with an aqueous HCl solution with a mass percentage concentration of 36-37%, and then the resulting pH was 2.0 The magnetic stirring speed of the mixed solution is controlled to be 300-500r / min, and after stirring for 1 hour, it is placed in a hydrothermal reaction kettle. The precipitation was washed with deionized water under the condition of superspeed until the pH of the eluate was neutral, and then the temperature was controlled at 80 °C and dried for 10 h, and then cooled to room temperature naturally to obtain WO 3 Na...

Embodiment 2

[0038] a WO 3 / C 3 N 4 The preparation method of composite photocatalyst specifically comprises the following steps:

[0039] (1), only the mixed solution is adjusted to pH 3.0 with an aqueous HCl solution with a mass percentage concentration of 36-37%, and the other steps (1) are the same as in Example 1;

[0040] (2), with the step (2) of embodiment 1, obtain C 3 N 4 ;

[0041] (3), with the step (3) of embodiment 1, obtain WO 3 / C 3 N 4 Composite Photocatalyst B.

Embodiment 3

[0043] a WO 3 / C 3 N 4 The preparation method of composite photocatalyst specifically comprises the following steps:

[0044] (1), only the mixed solution is adjusted to pH 3.5 with an aqueous HCl solution with a mass percentage concentration of 36-37%, and other steps (1) are the same as in Example 1;

[0045] (2), with the step (2) of embodiment 1, obtain C 3 N 4 ;

[0046] (3), with the step (3) of embodiment 1, obtain WO 3 / C 3 N 4 Composite photocatalyst C.

[0047] The WO obtained in the above step (1) was analyzed by X-ray diffractometer (PANalytical, PW3040 / 60, Netherlands). 3 Nano-powder was measured, the obtained WO 3 The X-ray diffraction pattern of the nanopowder is as follows: figure 2 shown, and with the standard WO 3 A comparison of the X-ray diffraction pattern of the card (00-043-1035, PDF card) shows that the resulting WO 3 Nano powder is pure phase.

[0048] The WO obtained in the above step (1) was analyzed by Hitachi S-4800 field emission sc...

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Abstract

The invention discloses a preparation method of a WO3 / C3N4 mixed photocatalyst. The preparation method comprises the following steps: taking sodium tungstate and sodium chloride as the raw materials, preparing WO3 through a hydrothermal method, subjecting the WO3 to an ultrasonic dispersion treatment to obtain processed WO3; taking urea as the raw material, burning urea to obtain C3N4 in one step, subjecting C3N4 to an ultrasonic dispersion treatment to obtain processed C3N4; mixing the processed WO3 nano powder and processed C3N4 by a mechanical means and ultrasonic waves in sequence, washing the mixture, subjecting the mixture to a centrifugal treatment, and finally drying the mixture at a temperature of 70 to 80 DEG C to obtain the WO3 / C3N4 composite photocatalyst. Under the same conditions, the catalytic degradation rate of rhodamine B of the provided photocatalyst is increased by 8%, compared with that of a conventional WO3 / C3N4 composite photocatalyst, which is prepared through a grinding method; moreover, the catalytic time is shorter, and one hour after the starting of the catalytic reactions, the catalytic degradation rate of rhodamine B can reach 99%.

Description

technical field [0001] The present invention relates to a WO 3 / C 3 N 4 The invention relates to a preparation method of a composite photocatalyst, which belongs to the field of nanometer science and technology. Background technique [0002] Semiconductor materials have the advantages of non-toxicity, low cost and unique physical and chemical properties, so their research has attracted extensive attention. C 3 N 4 As an N-type semiconductor, its light absorption threshold is about 420nm, which is higher than TiO, the most commonly used semiconductor material at present. 2 387nm. Visible, C 3 N 4 Has good light absorption capacity. And WO 3 Due to its small band gap, wide range of light absorption frequencies, effective use of visible light, strong hydrophilicity, good dispersion in water, and high photocatalytic efficiency, it can be used as a photocatalyst alone or with WO 3 Modified TiO 2 , carbon nanotubes, C 3 N 4 They can also be mixed with other semicondu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/24
Inventor 赵喆梁玉洁汪玉刘志福
Owner SHANGHAI INST OF TECH
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