Cross-scale two-dimensional large-stroke high-speed and high-precision motion platform

Abstract

The invention relates to a cross-scale two-dimensional large-stroke high-speed and high-precision motion platform. The cross-scale two-dimensional large-stroke high-speed and high-precision motion platform is of an H-shaped structure and is composed of a Y-direction working platform on the upper layer, an X-direction dual-edge driving working platform on the lower layer, a marble platform and a support. The Y-direction working platform on the upper layer is connected with the X-direction dual-edge driving working platform on the lower layer in series, a high-speed rolling linear guideway is used for guiding, and a grating ruler is adopted for position feedback. The Y-direction working platform on the upper layer is driven by a linear motor and is fixed to a movable platform of the X-direction dual-edge driving working platform on the lower layer through an adapter plate; the X-direction dual-edge driving working platform on the lower layer is driven by two linear motors at the same time and is fixed to the marble platform through screws; the marble platform is placed on the support. By means of the cross-scale two-dimensional large-stroke high-speed and high-precision motion platform, a two-dimensional motion platform driven by the linear motors, fed back by the grating ruler and guided by the rolling guideway is adopted, the structure is high, the rigidity is high, the bearing capacity is large, the positioning accuracy is high, and the two-dimensional large-stroke high-speed and high-precision motion can be achieved.

Description

technical field [0001] The invention relates to a cross-scale two-dimensional large-stroke high-speed and high-precision motion platform. Background technique [0002] With the rapid development of computer science and technology, the integration of semiconductor chip manufacturing continues to increase, and the existing lithography technology can no longer meet the requirements of high efficiency and high precision due to its inherent limitations. Therefore, nanoimprinting technology is proposed. . However, in the application of large-area imprinting technology, it is still difficult to solve the inertia problems of electrical systems and mechanical systems under high-speed conditions to achieve large or super-large strokes, high operating speed and positioning accuracy; on the other hand, large strokes or System parasitic errors such as flatness and parallelism of the mechanical system within a large travel range will inevitably make it extremely difficult to achieve nano...

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the large stroke and high positioning accuracy of the existing macro-micro two-stage positioning platform cannot be taken into account at the same time, and to invent a two-dimensional cross-scale based on the direct drive of the linear motor and the H-shaped series structure. The motion platform can realize large stroke, high speed and high precision at the same time, and has high rigidity and large carrying capacity, which is conducive to improving the manufacturing precision in the micro-nano field

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