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Ultra-smooth polishing process with surface roughness reaching 0.1 nanoscale

A surface roughness and nano-scale technology, which is applied in the direction of surface polishing machine tools, polishing compositions containing abrasives, grinding/polishing equipment, etc., can solve problems such as the inability to realize mass production of ultra-precision optical components, and achieve cost reduction. Low cost, simple operation and high operation requirements

Inactive Publication Date: 2014-07-23
壹埃光学(苏州)有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0011] The purpose of the present invention is to propose a solution to the problem that the existing ultra-smooth technology cannot realize the mass production of ultra-precision optical elements with a surface roughness RMS≤0.1nm

Method used

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  • Ultra-smooth polishing process with surface roughness reaching 0.1 nanoscale
  • Ultra-smooth polishing process with surface roughness reaching 0.1 nanoscale
  • Ultra-smooth polishing process with surface roughness reaching 0.1 nanoscale

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Embodiment Construction

[0051] This embodiment discloses an ultra-smooth polishing process whose surface roughness reaches 0.1 nanometer level. Polishing requirements for precision optical components with surface roughness RMS≤0.1nm.

[0052] The concrete steps of process described in the present embodiment are as follows:

[0053] (1) Fix the pre-ground optical element on the part plate (such as image 3 As shown, 01 is the main body of the part plate, 02 is the fixed wax, 03 is the part, 04 is the center hole), and then clean the parts with clean water, and enter the four stages of ultra-smooth polishing;

[0054] (2) Coarse polishing stage: use JP040.2C grinding and polishing machine, set the spindle speed of JP040.2C grinding and polishing machine to 150-200rpm, set the swing speed to 80-100rpm, and then fix the parts to be processed The disc is placed on the polishing mold connected to the main shaft of the JP040.2C grinding and polishing machine (such as Figure 5 As shown), the parts plate ...

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Abstract

The invention discloses an ultra-smooth polishing process with the surface roughness reaching 0.1 nanoscale. The process comprises four polishing stages and can achieve different polishing effects. The four polishing stages include the rough polishing stage with mechanical grinding as the main effect and removal of a damaged ground layer as the main purpose, the elaborate polishing stage with the physical effect as the major characteristic and achievement of certain surface flatness as the main purpose, the primary super polishing stage with the chemical effect as the major characteristic and removal of a damaged subsurface layer as the purpose and the super polishing stage with the rheomorphism as the major characteristic and achievement of RMS polishing as the purpose; as a result, atoms on the surface of an optical material are arranged again on one horizontal plane, and the polishing requirement that the surface roughness of an ultra-precise optical element meets the condition RMS<=0.1 nm is met. By means of the ultra-smooth polishing process with the surface roughness meeting the condition RMS<=0.1 nm, the stability of product quality is good, and batch production can be achieved.

Description

technical field [0001] The invention relates to the technical field of optical parts processing, in particular to the technical field of ultra-smooth polishing technology for ultra-precision optical elements with surface roughness RMS≤0.1nm. Background technique [0002] The current development of ultra-smooth polishing technology is diverse. There are ultra-smooth polishing technologies based on classical polishing technology innovations, such as: bath polishing, float polishing, hydration polishing, etc.; there are also ultra-smooth polishing technologies using new polishing principles, such as Ion beam polishing, polishing using high-speed water flow, etc.; some use field-effect assisted ultra-smooth polishing technology, such as magnetorheological polishing; some even use non-contact polishing, such as laser polishing. [0003] After reviewing China Patent Information Center, Wanfang Database, China Journal Full-text Database, China Science and Technology [0004] The...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/02
CPCB24B1/00B24B13/00C09G1/02
Inventor 曹雪官
Owner 壹埃光学(苏州)有限公司
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