La2Zr2O7 transition-layer gradient film structure, preparation and application thereof
A transition layer and thin film technology, applied in the direction of coating, device for coating liquid on the surface, etc., to achieve the effect of simple structure, reduced complexity, smooth and dense surface
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Embodiment 1
[0030] 1) Preparation of Ti-doped precursor solution: Titanium acetylacetonate and zirconium acetylacetonate, according to the molar ratio of titanium ions to zirconium ions is 1:9, where x=0.2, the total concentration of titanium ions and zirconium ions is 0.6mol / L, dissolved in propionic acid, and rotated and stirred at 40°C for 30 minutes to obtain a Ti-doped precursor solution;
[0031] 2) Preparation of Y-doped precursor solution: yttrium acetate and zirconium acetylacetonate, the molar ratio of yttrium ion to zirconium ion is 2:3, wherein, y=0.8, the total concentration of titanium ion and zirconium ion is 0.8mol / L, dissolved in propionic acid, and rotated and stirred at 40°C for 30 minutes to obtain a Y-doped precursor solution;
[0032] 3) Coating of the precursor solution: apply the Ti-doped precursor solution to the metal Ni substrate by spin coating to obtain the first layer of precursor film;
[0033] 4) High temperature sintering: in Ar4%H 2 Under the conditio...
Embodiment 2
[0037] 1) Preparation of Ti-doped precursor solution: Titanium acetylacetonate and zirconium acetylacetonate, according to the molar ratio of titanium ions to zirconium ions is 1:3, where x=0.5, the total concentration of titanium ions and zirconium ions is 0.6mol / L, dissolved in propionic acid, and rotated and stirred at 40°C for 30 minutes to obtain a Ti-doped precursor solution;
[0038] 2) Preparation of Y-doped precursor solution: yttrium acetate and zirconium acetylacetonate, the molar ratio of yttrium ion to zirconium ion is 1:1, where, y=1.0, the total concentration of titanium ion and zirconium ion is 1.0mol / L, dissolved in propionic acid, and rotated and stirred at 40°C for 30 minutes to obtain a Y-doped precursor solution;
[0039] 3) Coating of the precursor solution: apply the Ti-doped precursor solution to the metal Ni substrate by spin coating to obtain the first layer of precursor film;
[0040] 4) High temperature sintering: in Ar4%H 2 Under the condition ...
Embodiment 3
[0044] 1) Preparation of Ti-doped precursor solution: Titanium acetylacetonate and zirconium acetylacetonate, according to the molar ratio of titanium ions to zirconium ions is 1:1, where x=1.0, the total concentration of titanium ions and zirconium ions is 0.8mol / L, dissolved in propionic acid, and rotated and stirred at 40°C for 30 minutes to obtain a Ti-doped precursor solution;
[0045] 2) Preparation of Y-doped precursor solution: yttrium acetate and zirconium acetylacetonate, the molar ratio of yttrium ion to zirconium ion is 3:2, wherein, y=1.2, the total concentration of titanium ion and zirconium ion is 0.8mol / L, dissolved in propionic acid, and rotated and stirred at 40°C for 30 minutes to obtain a Y-doped precursor solution;
[0046] 3) Coating of the precursor solution: apply the Ti-doped precursor solution on the metal substrate by spin coating to obtain the first layer of precursor film;
[0047] 4) High temperature sintering: in Ar4%H 2 Under the condition o...
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