Device and method for measuring resistance distribution of nano film materials through atomic force microscope
A technology of atomic force microscope and nano-film material, which is applied in the direction of measuring device, scanning probe microscopy, instrument, etc., can solve the problems of large influence of current density distribution, large measurement error, inability to directly and accurately test conductivity, etc., to achieve The effect of low objective requirements, easy operation, and simple device structure
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[0022] Below in conjunction with accompanying drawing and embodiment the present invention will be described in further detail:
[0023] see figure 1 , the present invention is a device for measuring the resistance distribution of nano-film materials by atomic force microscope, comprising an insulating substrate 6, and a sample 4 to be measured placed on the insulating substrate 6, and rectangular electrodes 5 are respectively arranged on both sides of the sample 4 to be measured, wherein One electrode is connected to the positive pole of the DC power supply 1, the other electrode is connected to the negative pole of the DC power supply 1, the negative pole of the DC power supply 1 is grounded, and the electrode 5 is in contact with the sample 4 to be tested and does not cover the surface of the sample to be tested; to prevent the sample to be tested The insulating substrate 6 of 4 is placed on the piezoelectric displacement loading platform 7 of the atomic force microscope, a...
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