Calibration method of optical constant of metals and semiconductor thin film materials

Abstract

The invention relates to a method capable of precisely calibrating optical constant of metals and semiconductor thin film materials. The method is applicable to thin film state metals and semiconductor materials prepared by any processes. The method comprises the following steps: preparing a thin film sample with the thickness of 15-100nm; precisely calibrating the thickness by an X-ray total reflection spectrum method; testing a transmissivity spectral line and a reflectivity spectral line; and solving the optical constant by a graphical method. Compared with conventional spectrum direct analyzing method, the method provided by the invention can solve the problem of precisely solving the thickness of metals and semiconductor thin films, reduces the error caused by inability of precisely calibrating the thickness, simplifies the solving process and improves the solving precision and speed of the optical constant. The method has wide applicability and can provide accurate reference data to all scientific and engineering problems related to the optical constant of the metals and semiconductor thin film materials.

Description

technical field [0001] The invention relates to the field of basic research on the application of thin film materials, in particular to a calibration method for optical constants of metal and semiconductor thin film materials. Background technique [0002] Optical constants (N=n-k*i) are one of the basic properties of materials. The calibration of optical constants of thin film materials is the prerequisite for the optical application of such materials. Metal and semiconductor thin film materials are widely used in various fields, such as thin film solar cells, photothermal selective films, LED chip design, etc. In these specific applications, the premise of thin film structure design is to accurately calibrate the optical constants of the material. However, since metals and semiconductors are strong absorbing materials, the imaginary part k of their optical constants is not equal to 0, and there is one more unknown in the solution process than dielectric materials, which ...

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Problems solved by technology

However, the error of the theoretical calculation model itself and too many solution parameters make the accuracy of the solution process extremely low

figure 1 The solution space obtained when solving the optical constant of the Cr metal thin film at 900nm by the transmission spectroscopy method, the intersection of the contour lines in the figure are all possible solutions, which actually cannot judge the correct solution

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