Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for Preventing Adhesion of Adhesion Using Forced Film Type Fluid Treatment Device

A technology for fluid treatment and treatment of objects, which is applied in the direction of mixers with rotating stirring devices, mixing methods, chemical instruments and methods, etc., and can solve the problems of preventing methods from being disclosed and unable to make particles stably

Active Publication Date: 2016-06-15
M TECH CO LTD
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The microparticle production method proposed in Patent Document 2 is an extremely effective microparticle production method in that it can produce microparticles at low cost and low energy. particles, which sometimes cannot be stably produced and produced particles
This problem may be solved by preventing particles from adhering to the treatment surface, but no method for preventing adhesion has been disclosed so far.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for Preventing Adhesion of Adhesion Using Forced Film Type Fluid Treatment Device
  • Method for Preventing Adhesion of Adhesion Using Forced Film Type Fluid Treatment Device
  • Method for Preventing Adhesion of Adhesion Using Forced Film Type Fluid Treatment Device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1~3

[0102] (Examples 1-3, Comparative Examples 1-3) Production of Quinacridone Nanoparticles

[0103] Such as figure 1 As shown in , in the thin film fluid formed between the processing surfaces 1 and 2 with at least one of the processing surfaces that are arranged oppositely and can rotate relative to the other, uniform diffusion, agitation, and mixing are used. A reaction device in which a quinacridone solution in which an organic pigment quinacridone pigment (C.I. PigmentViolet 19, hereinafter PV-19) was dissolved in concentrated sulfuric acid was mixed with methanol, and the precipitation reaction was carried out in a thin film fluid.

[0104] A 2.0wt% PV-19 solution in which PV-19 powder is dissolved in concentrated sulfuric acid as the first fluid, that is, a raw material fluid, is fed from the center at supply pressure / back pressure = 0.350MPa / 0.02MPa, and methanol is used as the second fluid Introduce to processing surface 1 and 2. (speed: 1500rpm)

[0105] The first fl...

Embodiment 4~6、 comparative example 4~6

[0112] (Examples 4-6, Comparative Examples 4-6) Production of tin nanoparticles

[0113] Such as figure 1 As shown in , in the thin film fluid formed between the processing surfaces 1 and 2 that have oppositely arranged accessible and separable processing surfaces, at least one of which rotates relative to the other, uniform diffusion, agitation, Mixed reaction apparatus, the tin chloride solution that dissolves tin chloride in methanol, and in the mixed solvent of methanol and toluene dissolve the sodium borohydride that is as reducing agent and the Chio Calcol 08 (Kao Co., Ltd. system) mixed with reducing agent solution, and the reduction reaction is carried out in the thin film fluid.

[0114] A 5.3wt% tin chloride solution dissolved in methanol as the first fluid, that is, a raw material fluid, is fed from the center at supply pressure / back pressure = 0.300MPa / 0.02MPa, and the reducing agent solution is used as the second fluid Introduce to processing surface 1 and 2. (...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention provides a method for preventing the adhesion of deposits, which is a fluid treatment method, a thin film produced between at least two processing surfaces that are arranged opposite, can be approached and separated, and at least one of them rotates relative to the other. The fluid to be treated is mixed with the fluid to obtain a treated material, and the treated material is prevented from adhering to the above-mentioned processing surface constituting the flow path of the treated fluid. Using at least two types of fluids to be treated, including a raw material fluid containing at least one raw material and a fluid used to process the above-mentioned raw material, are arranged in opposite directions, can be approached and separated, and at least one of them is relatively opposite to the other. The fluid to be treated is mixed with the thin film fluid generated between the rotating at least two processing surfaces (1, 2) to obtain a processed raw material. At this time, by introducing the raw material fluid from the center of the processing surfaces (1, 2), the raw materials processed between the processing surfaces (1, 2) are prevented from adhering to the processing surfaces (1, 2).

Description

technical field [0001] The present invention relates to a method for preventing attachment of deposits. Background technique [0002] Microparticles are required in the entire industrial field, ranging from micron-sized particles to nano-sized particles, and it is necessary to manufacture particles separately according to the intended use. In particular, nanoparticles (nano-sized particles), which are particles with a particle diameter of less than 1 μm, exhibit new characteristics different from particles, and therefore it is necessary to develop a new production method for industrially producing nanoparticles. Conventional production methods for micron-sized microparticles have problems of reproducibility and energy consumption. Therefore, a production method for microparticles that can easily control the particle size from micron to nanometer is desired. [0003] In order to solve the technical problems and problems of the conventional "microchemical processing technolog...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01J19/00B01F3/08B01J13/00
CPCB01J19/1887C07D471/04B29C33/58B29C33/60B01F27/2712B01F27/2714B01J19/18B01J13/00B01F23/40
Inventor 荒木加永子前川昌辉本田大介榎村真一
Owner M TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products