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Vacuum coating machine

A technology of vacuum coating machine and vacuum chamber, which is applied in the directions of vacuum evaporation coating, sputtering coating, ion implantation coating, etc., and can solve problems such as low adhesion, peeling off of the coating film layer, and difficulty in controlling the thickness of the substrate coating film. , to achieve the effect of simple structure, high efficiency and convenient use

Inactive Publication Date: 2013-12-25
无锡启晖光电科技有限公司
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the prior art, when the vacuum coating machine is in use, the coating thickness of the substrate is not easy to control, and the quality of the coating and the adhesion of the film layer are not high, and it is easy to fall off from the substrate.

Method used

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  • Vacuum coating machine

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Embodiment Construction

[0014] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0015] Such as figure 1 Shown: a vacuum coating machine, including a vacuum chamber 1, an electron gun 2 and an auxiliary ion source 3 are arranged at the lower part of the inner cavity of the vacuum chamber 1, and an electron gun 2 and an auxiliary ion source 3 are arranged above the electron gun 2 and the auxiliary ion source 3. The substrate holder 4 of the ion source 3 is provided with a corresponding substrate heater 5 on the outside of the substrate holder 4, and a light control device is provided at the position where the top of the substrate holder 4 is connected to the top of the inner chamber of the vacuum chamber 1. System 6 and crystal control system 7, electron gun 2, auxiliary ion source 3, light control system 6 and crystal control system 7 are connected to monitoring equipment through signal lines, and light control system 6 detects chan...

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Abstract

The invention discloses a vacuum coating machine. The vacuum coating machine comprises a vacuum chamber (1), wherein an electronic gun (2) and an auxiliary ion source (3) are arranged at the lower part of a cavity of the vacuum chamber (1), a substrate frame over against the electronic gun (2) and the auxiliary ion source (3) are arranged above the electronic gun (2) and the auxiliary ion source (3), a substrate heater (5) is arranged at the outer side of the substrate frame (4); a light-operated system (6) and a crystal-operated system (7) are arranged at a connecting part of the top of the substrate frame (4) and the cavity top of the vacuum chamber (1), the electronic gun (2), the auxiliary ion source (3), the light-operated system (6) and the crystal-operated system (7) are connected with a monitoring device through signal lines. The substrate heater is used for stably and uniformly heating the substrate before coating film so as to improve the compactness and the uniformity of the film; an ion beam is used for bombarding the growing film to form a film structure with uniform compactness, the stability and quality of the coated film are improved so that the aim of improving the optical and mechanical performances of the coated film is achieved.

Description

technical field [0001] The invention relates to the technical field of coating, in particular to a vacuum coating machine for improving coating quality and coating layer stability. Background technique [0002] In the prior art, when the vacuum coating machine is in use, the coating thickness of the substrate is not easy to control, and the quality of the coating and the adhesion of the film layer are not high, and it is easy to fall off from the substrate. Contents of the invention [0003] The purpose of the present invention is to provide a vacuum coating machine which can improve the coating quality and the stability of the coating layer in view of the problems existing in the prior art. [0004] The purpose of the present invention is solved by the following technical solutions: [0005] A vacuum coating machine, comprising a vacuum chamber, characterized in that an electron gun and an auxiliary ion source are arranged at the lower part of the inner cavity of the va...

Claims

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Application Information

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IPC IPC(8): C23C14/30
Inventor 王朝阳宫睿
Owner 无锡启晖光电科技有限公司
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