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Equipment for purifying trichlorosilane

A technology for purifying trichlorosilane and trichlorosilane, which is applied in the direction of silicon halides, halosilanes, etc., can solve the problems of trichlorosilane to be improved, low purity of trichlorosilane, and many impurities in the product, and achieve High disproportionation reaction efficiency, low production cost, good effect

Active Publication Date: 2013-12-18
CHINA ENFI ENGINEERING CORPORATION
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AI Technical Summary

Problems solved by technology

However, the process for preparing trichlorosilane at this stage has many impurities in the product, and the purity of trichlorosilane is low, so further purification is required
[0003] However, the process and equipment for purifying trichlorosilane still need to be improved at this stage

Method used

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  • Equipment for purifying trichlorosilane
  • Equipment for purifying trichlorosilane
  • Equipment for purifying trichlorosilane

Examples

Experimental program
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Effect test

Embodiment 1

[0113] use Figure 3-Figure 11 device shown, refer to figure 1 and figure 2 According to the flow shown, according to the method for preparing polysilicon of the present invention, trichlorosilane is prepared and purified according to the following process steps, and then polysilicon is prepared:

[0114](1) Synthesis step of hydrochlorination: Silicon tetrachloride and hydrogen from the following steps (2) and (3) are mixed in a gas-liquid mixer, then exchange heat with the hydrogenation reactor outlet gas, and enter resistance heating Heating to a certain temperature, the mixed gas directly enters the hydrogenation reactor, the temperature is controlled at 500-550 degrees, the pressure is 1.5-3.5MPa, the ratio of silicon tetrachloride to hydrogen is 1:2-1:5, nickel-based or copper-based Under the action of catalyst, it reacts with silicon powder. After the reaction gas passes through the high-efficiency gas-solid dust collector, it exchanges heat with the gas from the ga...

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Abstract

The invention discloses equipment for purifying trichlorosilane. The equipment is a first rectifying and purifying device and used for conducting first rectifying and purifying treatment on trichlorosilane so as to obtain purified trichlorosilane and first rectifying residual liquid, wherein the first rectifying and purifying device consists of a first rectifying tower, a second rectifying tower and a third rectifying tower which are connected in series, the rectifying of the first rectifying tower is conducted at the temperature of 60-100DEG C and the pressure of 0.2MPa according to the reflux ratio of (10-50):1; the rectifying of the second rectifying tower is conducted at the temperature of 100-140DEG C and the pressure of 0.5MPa according to the reflux ratio of (20-50):1; the rectifying of the third rectifying tower is conducted at the temperature of 60-80DEG C and the pressure of 0.2MPa according to the reflux ratio of (20-50):1. The equipment can be utilized for effectively purifying the trichlorosilane, and is simple, safe, energy-saving and environment-friendly and low-cost in technique, the purity of the purified trichlorosilane is high, the purified trichlorosilane can be effectively utilized for producing polycrystalline silicon, and the produced waste liquor can be recycled.

Description

technical field [0001] The invention relates to the technical field of the photovoltaic industry, in particular to equipment for preparing and purifying trichlorosilane. Background technique [0002] As a renewable and clean energy source, solar energy has attracted global attention, and the technology of using solar energy resources to generate electricity has been considered as the most promising new energy technology in the world today. Therefore, the photovoltaic industry with solar power generation technology as the core has developed rapidly in the early 21st century. As the main raw material of the photovoltaic industry, polysilicon has seen a sharp increase in demand with the rapid development of the photovoltaic industry. Furthermore, the demand for trichlorosilane, the main raw material for the production of polysilicon, has also increased. However, the process for preparing trichlorosilane at the present stage has many impurities in the product, and the purity o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
Inventor 万烨张升学严大洲毋克力肖荣辉汤传斌杨永亮
Owner CHINA ENFI ENGINEERING CORPORATION
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