Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Manufacturing method of non-woven fabric for high permeability mask

A manufacturing method and technology of non-woven fabrics, which are applied in textiles, papermaking, non-woven fabrics, etc., can solve the problems that cannot meet the requirements of high penetration and high absorption of cosmetic liquids, non-woven fabrics with low toughness and skin-adhering properties, and non-woven fabrics. The problem of low permeability, etc., can improve the strength, reduce the anisotropy, and enhance the entanglement force.

Active Publication Date: 2016-08-10
HANGZHOU NBOND NONWOVENS
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing problems are: 1. After fully combing, the toughness and skin-adherence of the non-woven fabric produced in the wet state are not high. When the mask is used, the user's face must remain still. Once there is a facial relaxation action , it will cause the mask to detach from the skin
2. The permeability of the non-woven fabric produced is not high, which cannot meet the high penetration and high absorption requirements of the beauty liquid in the mask

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacturing method of non-woven fabric for high permeability mask
  • Manufacturing method of non-woven fabric for high permeability mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Embodiment 1: with reference to attached figure 1 . A kind of non-woven fabric of high-permeability film, comprising non-woven fabric layer; Non-woven fabric layer is made of short cellulose fiber as raw material, and each cellulose fiber is intertwined into high-permeability film non-woven fabric in disorder; the length of cellulose fiber is 13mm or 20mm.

Embodiment 2

[0021] Embodiment 2: with reference to attached figure 2 . A kind of manufacture method of above-mentioned high permeable mask non-woven fabric, comprises the following steps:

[0022] ① Prepare raw materials, using two kinds of cellulose fibers with a length of 5-25mm as raw materials;

[0023] ② After mixing the two kinds of raw material fibers according to a certain ratio, the raw material fiber slurry is formed;

[0024] ③ The raw fiber slurry flows into the forming machine for carding, and dehydrates on the forming net to form the first layer of fiber web;

[0025] ④The forming net in the forming machine is inclined, and the angle between the forming net and the horizontal plane is 15°~30°. A high-pressure pre-spun thorn head is installed above the forming machine. The first layer of wet fiber web is spunlace pre-entangled;

[0026] ⑤ Raw material fiber slurry flows into the forming machine to form the second layer of fiber web on the basis of the first layer of fibe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
lengthaaaaaaaaaa
lengthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a high-permeability mask nonwoven fabric, which is utilized as a base material of products, such as masks, has high-efficiency skin-closed permeability and toughness, is soft and delicate and has higher hydrophilia, and a manufacturing method of the high-permeability mask nonwoven fabric. The high-permeability mask nonwoven fabric is manufactured by the following steps of by utilizing cellulosic fiber with the length of 5-25mm as a raw material, through a high-pressure pre-spunlace head of a forming machine, carrying out pre-spunlace winding on a fiber web on a formed web, carrying out main spunlace reinforcing and winding, drying and coiling.

Description

technical field [0001] The invention relates to a non-woven fabric, in particular to a high-permeability mask non-woven fabric used as a base material of facial masks, cleansing papers, wet wipes and other products and a manufacturing method thereof. Background technique [0002] Non-woven fabrics are used as the base material of facial masks, cleansing paper, wet wipes and other products, which require high hygroscopicity and toughness in wet state. For high-end mask products, it must also have considerable permeability and fit with the skin. The invention patent with the patent application number 201110401665.X discloses "a production method of spunlace cotton blended spunlace nonwoven fabric", which uses a flat carding machine to replace the carding machine traditionally used in the nonwoven production line. After the fibers are fully carded, they are pre-wetted and hydroentangled. The existing problems are: 1. After fully combing, the toughness and skin-adherence of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): D04H1/425D04H1/492D04H1/74
Inventor 张杰
Owner HANGZHOU NBOND NONWOVENS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com