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Selective absorbing film set of radiation absorbing layer based on mixture

A technology of radiation absorption and mixture, which is applied in the direction of coating, layered products, sputtering coating, etc., can solve the problems of very strict equipment sealing requirements, difficult control of process parameters, pollution of the environment, etc., and achieve high photothermal conversion efficiency, The effect of improving industrial production efficiency, good high absorption and low radiation effect

Inactive Publication Date: 2013-11-27
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, as an absorbing film, TXT paint has a maximum absorption rate of only 92%, but an emissivity as high as 40%; chrome-plated film systems are rarely used because of their technological process polluting the environment; AlN / Al cannot be used in non-vacuum high-temperature environments. It has been used for a long time and has been eliminated; the preparation process of NiCrNxOy, TiNxOy and other heat absorbing films that are widely used at present needs to consider two reaction gases nitrogen and oxygen at the same time, and the process parameters are difficult to control due to the participation of oxygen, and the sealing of the equipment very strict

Method used

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  • Selective absorbing film set of radiation absorbing layer based on mixture
  • Selective absorbing film set of radiation absorbing layer based on mixture
  • Selective absorbing film set of radiation absorbing layer based on mixture

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Cu substrate / TiSiN / Si 3 N 4 / SiO 2 Absorbent film system.

[0034] The absorption film system is specifically: Cu substrate / TiN and Si3N4 mixture film (90nm), the mixing ratio is 0.36:0.64 / Si 3 N 4 Thin film (30nm) / SiO 2 Thin film (65nm).

[0035] The reflection spectrum of the film system is attached figure 2 As shown, the technical indicators of the film system are as follows:

[0036] According to the national standard GB / T6424-2007 and GB / T4271-2007, the absorption rate of this film system reaches 96.5%, and the emissivity is 3.5%.

Embodiment 2

[0038] Cu substrate / NiZnO / ZnO / SiO 2 Absorbent film system.

[0039] This absorption film system is specifically: Cu substrate / NiOx and ZnO mixture film (93nm), the mixing ratio is 0.37:0.63 / ZnO film (29nm) / SiO 2 Thin film (70nm).

[0040] The reflection spectrum of the film system is attached image 3 As shown, the technical indicators of the film system are as follows:

[0041] According to the national standard GB / T6424-2007 and GB / T4271-2007, the absorption rate of this film system reaches 97.1%, and the emissivity rate is 2.5%.

Embodiment 3

[0043] Cu substrate / porous TiN / ZnO / SiO 2 / Epoxy resin absorption film system.

[0044] The absorption film system is specifically: Cu substrate / porous TiN mixture film (120nm), the mixing ratio of TiN and pores is 0.75:0.25 / ZnO film (23nm) / SiO 2 Thin film (25nm) / epoxy resin film (26nm).

[0045] The reflection spectrum of the film system is attached Figure 4 As shown, the technical indicators of the film system are as follows:

[0046] According to the national standard GB / T6424-2007 and GB / T4271-2007, the absorption rate of this film system reaches 96.0%, and the emissivity is 4.0%.

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Abstract

The invention discloses a selective absorbing film set of a radiation absorbing layer based on mixture. The mixture is mixed by a superabsorbent material and a transparent material. The absorbing film comprises a metal substrate, and a selective absorbing film of the radiation absorbing layer based on the mixture, an antireflection dielectric film and a protective film which are deposited sequentially on the substrate. According to the selective absorbing film set, performances of the absorbing film can be controlled flexibly by adjusting the parameters of materials of the film set, the thickness of the coating, ingredients of the mixed film, the size, the shape and the like. The premise of maintaining high absorption and low emissivity can be met, and meanwhile, requirements of diversification and individuation of solar thermal products of solar water heaters and solar air conditioners can be met. The selective absorbing film set has the advantages that structure is simple, and the selective absorbing film set is adaptable to various processing and producing and has an important significance to development of the field of solar selective thermal absorbing films.

Description

technical field [0001] The invention relates to the design of a selective heat-absorbing film system of a solar heat collector, in particular to a high-absorption and low-radiation selective absorption film system based on a mixture heat-absorbing coating. technical background [0002] Solar thermal conversion is a solar energy utilization method with high energy conversion efficiency and utilization rate and low cost, which can be widely promoted in the whole society. At present, solar thermal utilization is the most active and has formed an industry. Due to the characteristics of fast photothermal conversion rate, high thermal efficiency, large lighting area, simple structure, reliable operation, reasonable cost, and strong pressure bearing capacity, flat plate collectors have a series of advantages such as perfect integration with buildings, It is developing rapidly in the field of energy utilization. Regardless of the form and structure of the solar collector, there mu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F24J2/48C23C14/06B32B9/04
CPCY02E10/40F24S70/25F24S70/225
Inventor 陆卫王晓芳俞立明王少伟陈飞良刘星星简明陈效双
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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