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A control method and control system for the production environment of lpcvd process

A control method and technology of production environment, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve the problems of long control time and low control accuracy.

Active Publication Date: 2016-02-03
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Problems solved by technology

[0004] The present invention provides a method and system for controlling the production environment of the LPCVD process, which is used to solve the problem of low control accuracy caused by the control of the temperature control and the degree of vacuum when controlling the production environment of the LPCVD process in the prior art. , control technical issues that take a long time

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  • A control method and control system for the production environment of lpcvd process
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  • A control method and control system for the production environment of lpcvd process

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Embodiment Construction

[0075] In order to better understand the present invention, the present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0076] The embodiment of the present invention provides a method for controlling the production environment of the LPCVD process, the control method is applied to the control system of the production environment of the LPCVD process, and the control system includes a closed reaction chamber, a feedback control device, and G temperature control subsystems And H vacuum control subsystems, G and H are positive integers; the temperature control subsystem includes a temperature sensor and a corresponding temperature adjustment device, and the vacuum control subsystem includes a vacuum sensor and a corresponding Vacuum adjustment device;

[0077] figure 1 is a flow chart of the control method described in the embodiment of the present invention, such as figure 1 As shown, the control method inclu...

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Abstract

The invention provides a control method for a low pressure chemical vapor deposition (LPCVD) technical production environment. The control method comprises the following steps that: S1, a temperature sensor acquires temperature information in a reaction cavity, and a vacuum degree sensor acquires vacuum degree information in the reaction cavity; S2, a feedback control device acquires the temperature information and the vacuum degree information and calculates feedback control gain parameters according to the temperature information and the vacuum degree information; S3, the feedback control device generates a temperature control signal according to the temperature information and the corresponding feedback control gain parameter and a vacuum degree control signal according to the vacuum degree information and the corresponding feedback control gain parameter, and sends the temperature control signal and the vacuum degree control signal to a temperature adjustment device and a vacuum degree adjustment device; S4, the temperature adjustment device adjusts the temperature in the reaction cavity according to the temperature control signal, and the vacuum degree adjustment device adjusts the vacuum degree in the reaction cavity according to the vacuum degree control signal.

Description

technical field [0001] The invention relates to the field of semiconductor processing and manufacturing, in particular to a method and system for controlling the production environment of an LPCVD process. Background technique [0002] According to the requirements of the low pressure chemical vapor deposition process (LPCVD, Low Pressure Chemical Vapor Deposition), there are certain requirements for the temperature and vacuum degree of the equipment reaction chamber used in the process, so the temperature control system and vacuum control system need to be designed in the LPCVD equipment, and the temperature and vacuum The degree is controlled within the standard of LPCVD process production environment. [0003] In the prior art, the temperature control system and the vacuum control system operate independently to achieve respective control indexes. However, the actual situation is that the change of vacuum degree will affect the change of temperature, that is, there is a ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/52
Inventor 王峰程朝阳张芳张海轮
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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