Control method and system for low pressure chemical vapor deposition (LPCVD) technical production environment

Abstract

The invention provides a control method for a low pressure chemical vapor deposition (LPCVD) technical production environment. The control method comprises the following steps that: S1, a temperature sensor acquires temperature information in a reaction cavity, and a vacuum degree sensor acquires vacuum degree information in the reaction cavity; S2, a feedback control device acquires the temperature information and the vacuum degree information and calculates feedback control gain parameters according to the temperature information and the vacuum degree information; S3, the feedback control device generates a temperature control signal according to the temperature information and the corresponding feedback control gain parameter and a vacuum degree control signal according to the vacuum degree information and the corresponding feedback control gain parameter, and sends the temperature control signal and the vacuum degree control signal to a temperature adjustment device and a vacuum degree adjustment device; S4, the temperature adjustment device adjusts the temperature in the reaction cavity according to the temperature control signal, and the vacuum degree adjustment device adjusts the vacuum degree in the reaction cavity according to the vacuum degree control signal.

Description

technical field [0001] The invention relates to the field of semiconductor processing and manufacturing, in particular to a method and system for controlling the production environment of an LPCVD process. Background technique [0002] According to the requirements of Low Pressure Chemical Vapor Deposition (LPCVD, Low Pressure Chemical Vapor Deposition), there are certain requirements for the temperature and vacuum degree of the equipment reaction chamber used in the process, so the temperature control system and vacuum control system need to be designed in the LPCVD equipment, Control the temperature and vacuum within the standard of LPCVD process production environment. [0003] In the prior art, the temperature control system and the vacuum control system operate independently to achieve respective control indexes. However, the actual situation is that the change of vacuum degree will affect the change of temperature, that is, there is a coupling relationship between the...

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Problems solved by technology

[0004] The present invention provides a method and system for controlling the production environment of the LPCVD process, which is used to solve the problem of low control accuracy caused by the control of the temperature control and the degree of vacuum when controlling the production environment of the LPCVD process in the prior art. , control technical issues that take a long time

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