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Three-freedom-degree precise regulating device based on ball location

A precision adjustment and ball positioning technology, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problems of large space occupied by the motion pair, crawling phenomenon of the mechanism, gaps in the motion pair, etc., and achieve excellent dynamic performance , low cost, and the effect of meeting strict restrictions

Inactive Publication Date: 2014-12-10
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the traditional parallel pose adjustment structure uses traditional kinematic pairs to form the branch chain of the parallel mechanism. Such an adjustment mechanism has three disadvantages, namely: the traditional kinematic pair occupies a large space, there are gaps in the kinematic pair, and the mechanism crawls within the range of micro-displacement Phenomenon

Method used

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  • Three-freedom-degree precise regulating device based on ball location
  • Three-freedom-degree precise regulating device based on ball location
  • Three-freedom-degree precise regulating device based on ball location

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Embodiment Construction

[0024] The specific implementation process of the present invention will be described below in conjunction with the accompanying drawings and embodiments.

[0025] Such as figure 1 As shown, the optical system S1 of the immersion lithography machine runs through the main frame 1 of the immersion lithography machine, the three-degree-of-freedom precision adjustment device S2 based on ball positioning, and the immersion unit S3 of the immersion lithography machine, and is at the bottom through the immersion flow field 2 The silicon wafer 3 is exposed; the three-degree-of-freedom precision adjustment device S2 based on ball positioning is installed between the main frame 1 of the immersion lithography machine and the immersion unit S3 of the lithography machine, and the three-degree-of-freedom precision adjustment device S2 based on ball positioning passes The installation substrate installation hole 4D is installed on the main frame 1, and the photolithography machine immersion ...

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Abstract

The invention discloses a three-freedom-degree precise regulating device based on ball location. The device is installed between a main frame and an immersing unit of an immersed photo-etching machine; a mounting substrate and a connecting plate of the device are connected in parallel by three groups of same moving branched chains; each group of moving branched chain orderly consists of a linear moving pair, a ball fixing block, a ball and two guiding cylinders from the mounting substrate to the connecting plate; and two pre-tightening springs are respectively arranged at two sides of each group of moving branched chain. The three-freedom-degree precise regulating device disclosed by the invention is used for realizing installation and fixation of the immersing unit of the immersed photo-etching machine and precise regulation of a spatial posture of the immersing unit and realizing submicron-grade precise location of the immersing unit; the pre-tightening force of the pre-tightening springs ensures reliable contact between the ball and each guiding cylinder, so that the problems of existence of clearances and the creeping of the traditional moving pair in a micro-displacement range are solved; the structure connected in parallel enhances the rigidity of the system; and by the use of a modularized design, the three-freedom-degree precise regulating device can be used for three-freedom-degree precise regulation in places besides the immersed photo-etching machine.

Description

technical field [0001] The invention relates to a three-degree-of-freedom precision adjustment device, in particular to a three-degree-of-freedom precision adjustment device based on ball positioning. Background technique [0002] As the core equipment for manufacturing VLSI, lithography plays a vital role in IC integration. Since the birth of the lithography machine, people have been working hard to improve the lithography resolution of the lithography machine. However, deep ultraviolet (DUV) dry lithography has reached its physical limit after the resolution spanned 45nm. Immersion lithography technology has become the mainstream technology breaking through the 45 nm node, which is of great significance to improve the resolution of lithography. [0003] In an immersion lithography machine, it is required to fill an immersion flow field between the last projection objective lens and the silicon wafer. The immersion flow field is generated by the immersion unit, and in or...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 傅新廖安志陈文昱邵杰杰
Owner ZHEJIANG UNIV
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