Base plate washing equipment and base plate washing system

Abstract

The embodiment of the invention provides base plate washing equipment and a base plate washing system, relating to the field of display manufacture and being capable of adaptively replenishing a washing liquid to a washing unit through a liquid replenishing unit, saving the washing liquid, shortening resetting time of the base plate washing equipment and avoiding a crash problem caused by synchronous resetting of two base plate washing equipment on an assembly line. The base plate washing equipment comprises the washing unit and the liquid replenishing unit which are communicated with each other, a liquid replenishing control device arranged between the washing unit and the liquid replenishing unit and used for controlling a flowing state of the liquid, and a controller connected with the liquid replenishing control device and used for controlling the liquid replenishing control device to act, wherein the washing unit is used for storing the washing liquid and washing a base plate; the liquid replenishing unit is used for storing the washing liquid and replenishing the washing liquid to the washing unit; and the controller is used for controlling the flowing state of the washing liquid between the liquid replenishing unit and the washing unit by controlling actions of the liquid replenishing control device.

Description

technical field [0001] The invention relates to the field of display manufacturing, in particular to a substrate cleaning device and a substrate cleaning system. Background technique [0002] In the manufacturing process of TFT-LCD (Thin Film Transistor-Liquid Crystal Display, thin film transistor liquid crystal display), the cleaning equipment needs to clean the substrate before photolithography (that is, the substrate before coating photoresist) to remove Impurities on the substrate surface. [0003] In the current substrate cleaning process, two substrate cleaning devices are often used to clean the substrate in a manner of alternately working. After setting the cleaning cycle and cleaning quantity on the two substrate cleaning equipments, the two equipments take turns to reset regularly. Wherein, "resetting" refers to a process in which the substrate cleaning equipment discharges the waste liquid, refills the cleaning liquid into the cleaning tank and heats it. The cl...

AI Technical Summary

Problems solved by technology

At this time, since the first substrate cleaning equipment has cleaned a certain number of substrates, when the first substrate cleaning equipment reaches the set cleaning quantity, the first substrate cleaning equipment will drain all the cleaning liquid, Supplementing new cleaning solution, this process causes a great waste of cleaning solution, and reset will waste a lot of time

In addition, if the first substrate cleaning equipment and the second substrate cleaning equipment are reset at the same time, it will cause a crash, and there will be no substrate cleaning equipment on the assembly line to work, which will affect the cleaning efficiency

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