Pixel structure and manufacturing method of pixel structure
A pixel structure and manufacturing method technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, transistors, etc., can solve the problems of reducing the display aperture ratio of the pixel structure and increasing the area of the metal pattern, and achieve the effect of increasing the display aperture ratio
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[0039] Figure 1A to Figure 6A It is a schematic top view of the components produced in each step of the method for fabricating the pixel structure according to an embodiment of the present invention, and Figure 1B to Figure 6B respectively Figure 1A to Figure 6A Schematic cross-sectional view along line I-I'. Please refer to Figure 1A and Figure 1B A method for fabricating a pixel structure according to an embodiment of the present invention includes fabricating a patterned conductor layer 110 on a substrate 10 to form a gate 112 to be connected to a scan line 114 . Specifically, the gate 112 formed by the patterned conductive layer 110 and the scan line 114 are formed by a continuous pattern, so the gate 112 can be regarded as a part of the scan line 114 . However, in other embodiments, the patterned conductor layer 110 may include a linear pattern with a fixed line width and a branch pattern connected to the linear pattern, wherein the scan line 114 may be formed by s...
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