Gas leveling device for improving etching process

Abstract

The invention discloses a gas leveling device for improving an etching process. The device comprises a gas inlet pipe and a gas leveling ring, wherein the gas inlet pipe and the gas leveling ring are made of hollow pipes and communicated with each other, the connection portion of the gas inlet pipe and the gas leveling ring is sealed, and the surface of a plane of the gas leveling ring is provided with gas holes. By the aid of the device, reacting gas is transported to a position which is close to a sampling platform directly and accurately, the dirt of the acting gas for a cavity is reduced, the gas is distributed on the surface of an etched article evenly, and the etching has good uniformity.

Description

technical field [0001] The invention relates to the technical field of etching technology, in particular to a gas uniform device for improving the etching technology. Background technique [0002] Etching process is an important part of microfabrication, generally divided into wet etching and dry etching. Among them, the commonly used dry etching methods include ICP, RIE, IBE, etc. These dry etching methods require the participation of a certain amount of reaction gas, and the uniformity of the gas flow determines the uniformity of the etching, while in the high vacuum reaction Only a small amount of gas needs to be delivered near the sample stage. The currently used method is to supply gas to the entire reaction chamber through the wall of the vacuum chamber or use a gas pipe to transport the reaction gas to a designated position. These methods have certain disadvantages. When gas is supplied to the entire cavity for reactive etching, it will affect the cavity. Long-term ...

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Problems solved by technology

These methods have certain disadvantages. When gas is supplied to the entire cavity for reactive etching, it will affect the cavity. Long-term etching will affect the sealing of the equipment. Highly demanding reactions cannot be carried out

It is also difficult to ensure the uniformity of the gas by using the gas pipe to supply the gas to the designated position. Therefore, how to accurately transport the reaction gas to the vicinity of the sample stage and maintain good uniformity is the key issue to ensure the quality of the reaction.

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